Clean Room Labs Clean Room Labs Start this weekStart this week

•Lectures will only be on Tuesday Lectures will only be on Tuesday

until further noticeuntil further notice•You will meet in the Cameron clean You will meet in the Cameron clean room at your Team designated timeroom at your Team designated time

•Do not miss a Clean Room labDo not miss a Clean Room lab•If you do miss a clean room lab, you If you do miss a clean room lab, you can attend another team’s time to can attend another team’s time to

get caught upget caught up

CAMERON Hall CAMERON Hall formerly know as Cameron Applied research formerly know as Cameron Applied research

Center (CARC)Center (CARC)

Craver Craver RoadRoad

Main Entrance Main Entrance The clean room is just at the top of the stairs The clean room is just at the top of the stairs

Side entrance – Second FloorSide entrance – Second FloorThe clean room is just inside these doorsThe clean room is just inside these doors

Second floor rear entrance Second floor rear entrance to Cameron to Cameron

The clean room is in the opposite corner The clean room is in the opposite corner from this entrance, on the same floorfrom this entrance, on the same floor

Main viewing window into Main viewing window into the clean roomthe clean room

Door to Door to clean clean

room is room is herehere

Enter the clean room Enter the clean room gowning area – The TA will gowning area – The TA will

let you inlet you in

Door to the clean roomDoor to the clean room

Remove coats, hats, back packs, Remove coats, hats, back packs, etc. and prepare to put on the etc. and prepare to put on the

clean room garments clean room garments

Following the TA’s Following the TA’s instructions – put on the instructions – put on the

clean room garmentsclean room garments

Sign in sheet is located on wire table inside the garment Sign in sheet is located on wire table inside the garment change roomchange room

Be sure to sign in – credit for attending the clean room Be sure to sign in – credit for attending the clean room sessions are taken from the sign in sheetsessions are taken from the sign in sheet

Locate and Locate and understand understand how to use how to use the safety the safety apparatusapparatus

Each team will receive a wafer Each team will receive a wafer box and 8 100mm silicon box and 8 100mm silicon

waferswafers

Special Special tweezers tweezers

are used to are used to handle handle silicon silicon waferswafers

Engr 1202 ECE LabEngr 1202 ECE LabMicro Planar Antenna TravelerMicro Planar Antenna Traveler

OPERATION DATE DATE DATE DATE DATE DATE DATE DATE PROCESSNAME WF 1 WF 2 WF 3 WF 4 WF 5 WF 6 WF 7 WF 8 DESCRIPTION

Starting Material Silicon 100mm or other substrateClean Clean H2O2 / H2SO4 2:3 for 10 min Use 100ml:150ml for single wafer Rinse - DIH2O - 5 min minimum

Dip - 10:1 - DIH2O/HF - 10 secRinse - DIH2O - 15 minutes max Record resistivity ______________Dry - Rinser/Dryer - Dry only cycle

Dielectric Formation Use 1100C oxidation furnace # 6 Load wafers, N2 running

5' N2 to stabilize temperature5' N2 + O230' N2 + O2 + H2 (steam)5' N2 + O2Unload, N2 running

Deposit Conductor Conductor material ____________________Load conductor if necessary. Record machine name/number _________Start pump down cycle Record time at start _____________Begin deposition Record pressure at start _____________Record final thickness ____________AVent chamber and unload wafers

Create Mask Create autocad drawingArray drawing and print directly on to ink-jet transparency

Trim Mask Trim mask to about 105 mm diameterConductor Spin photoresist - 60 sec @ 4K rpm - Microposit 1813 photoresist Photolithography Soft bake - 60 sec hotplate @ 115C

Align - align wafer flat to stop on wafer chuckCheck mask aligner UV lamp intensityExpose - typical 10-15 sec.Develop - use either spray developer or manual developingInspect - lab manager or TA Strip PR and repeat if necessaryHard bake - 10' @ 90C (optional)

Conductor Etch Etch with appropriate etch solution. Record etch solution _____________Rinse in DIH2O for 10 minDry - Rinser/Dryer - Dry only cycle

Inspect - lab manager or TAPR strip 5' Acetone + 5' Methanol + 5' DIH2o rinse + N2 dryDice Saw cut with microautomation 1100 diamond saw Clean and dry

Homework AssignmentHomework Assignment

1.1. Meet as a teamMeet as a team2.2. Select a team leaderSelect a team leader3.3. Use the form listed for Assignment #6Use the form listed for Assignment #64.4. Record members in attendance and time Record members in attendance and time

of meetingof meeting5.5. Decide on application, Cellular, Decide on application, Cellular,

Bluetooth/Wi-Fi, RFIDBluetooth/Wi-Fi, RFID6.6. Team leader to e-mail me with the time of Team leader to e-mail me with the time of

meeting, team members in attendance, meeting, team members in attendance, and your team’s choice of applicationand your team’s choice of application

7.7. Preliminary choice - can be changed laterPreliminary choice - can be changed later