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Bit-Line Biasing Technique for Phase-Change Memories F. Bedeschi 1 , C. Boffino 2,3 , E. Bonizzoni 2,3 , O. Khouri 4 , C. Resta 1,3 , and G. Torelli 2 1 STMicroelectronics, Memory Products Group R&D, via Olivetti, 2 - 20041 Agrate Brianza, Italy 2 Department of Electronics, University of Pavia, via Ferrata, 1 - 27100 Pavia, Italy 3 Studio di Microelettronica, STMicroelectronics, via Ferrata, 1 - 27100 Pavia, Italy 4 STMicroelectronics, Memory Products Group, via Olivetti, 2 - 20041 Agrate Brianza, Italy Abstract - This paper presents a bit-line biasing technique that ensures read and write voltages to be fed to the storage element with adequate accuracy, high rejection of disturbs from the column decoder supply line, and protection against spurious program operations in read mode. Fast bit-line precharge and sensing are also achieved. The presented technique has been developed for phase-change memories, however, it is also suitable for use in other non-volatile storage devices such as Flash memories. Experimental results on read and program operations demonstrated the effectiveness of the approach. I. INTRODUCTION Today high-performance portable equipments demand for non-volatile memories with higher and higher read/write speed and endurance. Phase-Change Memory (PCM) [1], [2] is a very promising technology to meet these requirements. In fact, PCMs ensure fast read/write operations as compared to currently dominant Flash memories, together with high endurance, process simplicity, and excellent compatibility with standard CMOS fabrication process. A further key advantage with respect to Flash memories is very fine write granularity with no need for block erase. In PCMs, also referred to as Ovonic Unified Memories (OUMs), the storage device consists of a thin film of chalcogenide alloy (in our case, Ge 2 Sb 2 Te 5 , GST) [3]. This material can reversibly change between an amorphous (high impedance, RESET state) and a polycrystalline (low impedance, SET state) phase when thermally stimulated, thus allowing data storage. The phase conversion of any storage element is obtained by appropriately heating (by means of electrical pulses applied to a suitable heater element) and then cooling a small, and thermally isolated, portion of the material. Once the chalcogenide material melts, it completely loses its crystalline structure. When rapidly cooled, the chalcogenide material is locked into its amorphous state (to this end, the cooling operation rate has to be faster than the crystal growth rate). To switch the memory element back to its crystalline state, the chalcogenide material is heated to a temperature between its glass transition temperature and its melting point temperature. In this way, nucleation and micro-crystal growth occur in several ns, thus leading to a (poly)crystalline state and, hence, to a percolation path for the conduction. From the above description, it is apparent that the storage element can be modelled as programmable resistor (high resistance = logic 0; low resistance = logic 1). In order to reduce reprogramming time, SET and RESET operations are performed without resorting to program&verify and erase&verify techniques [4], [5]. Very accurate electrical pulses have therefore to be applied to the addressed bit-lines and, hence, to the selected cells. Reading a cell basically consists in measuring the resistance of the addressed storage device. In read operations, a suitable sensing voltage is forced across the storage element of the addressed cell, and the stored data is detected by sensing the current flowing through the cell [6]. In practice, the cell current is compared to a reference current provided by an identical cell programmed to a suitable resistance value. To obtain the best sense accuracy, the reference cell is located within the memory array and is identically biased. This choice minimizes boundary effects

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Bit-Line Biasing Technique

for Phase-Change Memories

F. Bedeschi1, C. Boffino

2,3, E. Bonizzoni

2,3, O. Khouri

4, C. Resta

1,3, and G. Torelli

2

1 STMicroelectronics, Memory Products Group R&D, via Olivetti, 2 - 20041 Agrate Brianza, Italy

2 Department of Electronics, University of Pavia, via Ferrata, 1 - 27100 Pavia, Italy

3 Studio di Microelettronica, STMicroelectronics, via Ferrata, 1 - 27100 Pavia, Italy

4 STMicroelectronics, Memory Products Group, via Olivetti, 2 - 20041 Agrate Brianza, Italy

Abstract - This paper presents a bit-line biasing

technique that ensures read and write voltages to be fed

to the storage element with adequate accuracy, high

rejection of disturbs from the column decoder supply

line, and protection against spurious program

operations in read mode. Fast bit-line precharge and

sensing are also achieved. The presented technique has

been developed for phase-change memories, however, it

is also suitable for use in other non-volatile storage

devices such as Flash memories. Experimental results

on read and program operations demonstrated the

effectiveness of the approach.

I. INTRODUCTION

Today high-performance portable equipments demand

for non-volatile memories with higher and higher read/write

speed and endurance. Phase-Change Memory (PCM) [1],

[2] is a very promising technology to meet these

requirements. In fact, PCMs ensure fast read/write

operations as compared to currently dominant Flash

memories, together with high endurance, process

simplicity, and excellent compatibility with standard

CMOS fabrication process. A further key advantage with

respect to Flash memories is very fine write granularity

with no need for block erase.

In PCMs, also referred to as Ovonic Unified Memories

(OUMs), the storage device consists of a thin film of

chalcogenide alloy (in our case, Ge2Sb2Te5, GST) [3]. This

material can reversibly change between an amorphous (high

impedance, RESET state) and a polycrystalline (low

impedance, SET state) phase when thermally stimulated,

thus allowing data storage. The phase conversion of any

storage element is obtained by appropriately heating (by

means of electrical pulses applied to a suitable heater

element) and then cooling a small, and thermally isolated,

portion of the material. Once the chalcogenide material

melts, it completely loses its crystalline structure. When

rapidly cooled, the chalcogenide material is locked into its

amorphous state (to this end, the cooling operation rate has

to be faster than the crystal growth rate). To switch the

memory element back to its crystalline state, the

chalcogenide material is heated to a temperature between

its glass transition temperature and its melting point

temperature. In this way, nucleation and micro-crystal

growth occur in several ns, thus leading to a

(poly)crystalline state and, hence, to a percolation path for

the conduction.

From the above description, it is apparent that the

storage element can be modelled as programmable resistor

(high resistance = logic 0; low resistance = logic 1). In

order to reduce reprogramming time, SET and RESET

operations are performed without resorting to

program&verify and erase&verify techniques [4], [5]. Very

accurate electrical pulses have therefore to be applied to the

addressed bit-lines and, hence, to the selected cells.

Reading a cell basically consists in measuring the

resistance of the addressed storage device. In read

operations, a suitable sensing voltage is forced across the

storage element of the addressed cell, and the stored data is

detected by sensing the current flowing through the cell [6].

In practice, the cell current is compared to a reference

current provided by an identical cell programmed to a

suitable resistance value. To obtain the best sense accuracy,

the reference cell is located within the memory array and is

identically biased. This choice minimizes boundary effects

and allows thermal tracking between the reference and the

array cells. During read operation, the value of the sensing

voltage has to be adequately low, accurate, and stable so as

not to perturb the state of the cell and to prevent the risk of

any spurious SET pulse.

In order to provide the read and program voltages to the

storage element with the required accuracy and stability, an

adequate bit-line biasing technique is needed. In this paper,

a bit-line biasing technique designed for PCMs is presented.

A cascode scheme allows the desired read and write

voltages with the required features to be fed to the storage

element. Furthermore, the proposed approach ensures high

rejection to disturbs. The proposed bit-line biasing

technique was integrated in a 4-Mb (2048 rows 2048

columns) MOSFET-selected PCM test-chip fabricated in

single-poly, single-well, double-metal, p-substrate 3-V

0.18- m CMOS technology, and experimentally evaluated.

II. CIRCUIT DESCRIPTION

To be more specific, here and in the following, we refer

to the case of PCMs, although all concepts are also valid for

other non-volatile storage devices such as Flash memories.

Figure 1 shows a schematic diagram of a conventional bit-

line biasing technique applied to a PCM device. In

particular, a detail of a bit-line including two memory

elements together with the associated selection transistors is

depicted. In this figure, MOS selection devices are

assumed, although substrate bipolar transistor can also be

used [7]. The column selector for each bit-line is

implemented by three PMOS transistors, M1, M2, and M 3

(alternatively, NMOS transistors can be employed). The

number of selection transistors depends upon the size of the

memory array and the hierarchical organization of the

column decoder. The gates of M1, M 2, and M3 are fed by

column selection signals KL, K M, and K N, respectively,

which are generated by a column decoder (not shown).

In a PCM device, high voltages are required to perform

SET and RESET operations. In a single-supply chip, these

voltages are produced by using on-chip voltage multipliers,

which are generally based on charge pump techniques [8].

The charge pump feeds a voltage regulator, which, in turn,

provides the supply voltage to the program load circuit. The

latter consists essentially of a switch that connects the

column selector to the voltage regulator output only during

program operations. During reading, the program load

disconnects the charge pump and the voltage regulator from

the column selector, and the latter is connected to the input

of the read circuit. The read circuit compares the current

flowing through the addressed memory cell with the current

flowing through a reference memory cell (not shown),

thereby detecting the stored contents. From Fig. 1, it is

apparent that the voltage at node D (bit-line voltage) is

equal to the voltage at node A (column decoder supply line)

minus the voltage drop across the selection switches M1,

M2, and M3. Consequently, the bit-line voltage is affected

by inaccuracies due to technological process spreads which

impact over the on-resistance of switches and the variations

of the current drawn by the addressed memory cell.

Moreover, the higher the number of selection switches in

the column selector, the less accurate and controlled the bit-

line voltage, during both programming and reading.

Furthermore, in the column decoding architecture shown in

Fig. 1, disturbs present on nodes A, B, and C is transmitted

to the bit-line, thus adversely affecting the operation being

carried out. As a result, program and sense accuracy, as

well as program time, are adversely affected, with ensuing

degradation of yield, performance, and reliability of the

device.

Fig. 1 – Schematic diagram of a conventional bit-line biasing

technique applied to a PCM device.

The above drawbacks are overcome by using the bit-line

biasing scheme illustrated in Fig. 2. The Operation Control

(OC) block provides the regulated read and program

voltages, VREAD and VPROG, respectively, to the gate of

natural transistor YO (which operates in the saturation

region). In this way, the bit-line voltage (node D) turns out

to be:

VD= V

G,YO Vth+V

ov( ) (1)

where VG,YO, V th, and Vov are the gate biasing voltage, the

threshold voltage (including the body effect contribution),

and the overdrive voltage of transistor YO, respectively.

By appropriately driving the gate of transistor YO, it is

possible to accurately bias the bit-line during both read and

program operations. The obtained bit-line voltage turns out

to be independent of the voltage drops across the selection

switches M1, M2, and M3. The accuracy and the stability of

the bit-line voltage depend almost exclusively upon the

accuracy and the stability of the voltage supplied to the gate

of transistor YO (VREAD or VPROG). It should be pointed out

that lines VREAD and VPROG are not required to supply any

DC current, and can thus be easier designed so as to ensure

the required performances. Furthermore, thanks to the

cascode configuration, adequate rejection of any ripple or

fluctuation on node A, B, and C is ensured. Consequently,

the constraints on the stability and precision of the column

decoder supply (node A) are less stringent as compared to

the case of the scheme shown in Fig. 1, which leads to

relaxed design specifications for the charge pump and the

voltage regulator. In some applications, the latter circuit can

be eliminated, with ensuing advantages in terms of silicon

area and power consumption. During reading, the proposed

bit-line biasing technique provides self-protection against

spurious SET pulses thanks to the high rejection to disturbs,

while still ensuring adequate bit-line precharge and sensing

speed.

Fig. 2 – Schematic diagram illustrating the proposed

bit-line biasing technique

III. EXPERIMENTAL RESULTS

The proposed bit-line biasing scheme was integrated in a

4-Mb (2048 rows 2048 columns) MOSFET-selected

PCM test-chip, fabricated in single-poly, single-well,

double-metal, p-substrate 3-V 0.18- m CMOS technology.

Table 1 summarizes the read and write currents together

with bit-line and word-line voltages for selected (Sel) and

unselected (No Sel) cells. Figure 3 shows a chip

microphotograph.

The nominal power supply Vdd and the column decoder

supply VA were set to 1.8 V and 3.3 V, respectively, so as to

allow correct operations during both reading and

programming. In order to evaluate the effectiveness of the

proposed bit-line biasing approach, a triangular signal,

provided by an external waveform generator, has been

superimposed to VA, thus emulating the ripple of a charge

pump or a possible circuit disturb. Correct operation has

been demonstrated during both reading and programming

when applying a disturb signal with a peak-to-peak

amplitude of 220 mV and a period of 20 ns.

Table 1 – Voltages and currents for selected (Sel)

and unselected (No Sel) cells.

READ SET RESET

V(V) I( A) V(V) I( A) V(V) I( A)

Sel 1.8 0 3 0 3 0WL

No Sel 0 0 0 0 0 0

Sel 0.4 0-80 1.5 300 2.7 600BL

No Sel 0 0 0 0 0 0

Fig. 3 – Microphotograph of the test chip.

In particular, Fig. 4 shows the measured voltage

waveforms in consecutive RESET and SET operations (VA

= column decoder supply; BL = bit-line; WL = word-line;

WE = write enable, active high). It should be noted that

during the RESET operation, the falling edge of the

addressed word-line voltage has to be very sharp so as to

allow the melted GST material to be rapidly cooled, thus

correctly amorphizing the cell. This operation, referred to

as quenching, is carried out by keeping the word-line fall

time within few ns (in our case, 2 ns). From Fig. 4, a

RESET pulse of 40 ns and a SET pulse of 150 ns were

demonstrated without any appreciable disturb on the bit-

line voltage.

A fully symmetrical sense amplifier topology [6] was

integrated in the test-chip to ensure zero systematic offset

together with adequate rejection of disturbs due to

capacitive coupling with noisy substrate, power supply, and

ground. As mentioned in the Introduction, the sense

amplifier compares the addressed cell current to a reference

cell current. Figure 5 illustrates the measured voltage

waveforms when reading a SET cell (OE_N = output

enable, active low; OUTPUT DATA = I/O pin; cell current

= 80 A; reference current = 30 A). The achieved read

access time is 45 ns. Also in this case, no appreciable

disturbs on the bit-line voltage are observed.

Fig. 4 – Measured voltage waveforms during SET and RESET

operations (WL, BL: active probes, attenuation by a factor of 10).

Fig. 5 – Measured voltage waveforms when reading a SET cell

(OE_N and BL: active probes, attenuation by a factor of 10).

IV. CONCLUSIONS

In this paper, a bit-line biasing technique has been

presented. The proposed approach allows read and write

voltages to be fed to the storage element with adequate

accuracy, high rejection of disturbs from the column

decoder supply line, and protection against spurious

program operations in read mode. Fast bit-line precharge

and sensing are also ensured. The proposed scheme was

integrated in a 4-Mb MOSFET-selected Phase-Change

Memory test-chip and experimentally evaluated. Although

the presented technique has been developed for PCM

technology, it is also suitable for use in other non-volatile

storage devices such as Flash memories.

REFERENCES

[1] S. Tyson, G. Wicker, T. Lowrey, S. Hudgens, and K. Hunt,

“Nonvolatile, high density, high performance phase-change

memory”, Proc. 2000 IEEE Aerospace Conference, vol. 5, pp.

385-390, March 2000.

[2] M. Gill, T. Lowrey, and J. Park, “Ovonic Unified Memory – A

high performance nonvolatile memory technology for stand-

alone memory and embedded applications”, 2002 IEEE Solid-

State Circuits Conference Dig. Tech. Pap., vol.1, pp. 458-459,

Feb. 2002.

[3] F. Pellizzer, A. Pirovano, F. Ottogalli, M. Magistretti, M.

Scaravaggi, P. Zuliani, M. Tosi, A. Benvenuti, P. Besana, S.

Cadeo, T. Marangon, R. Piva, A. Spandre, R. Zonca, A.

Modelli, E. Varesi, T. Lowrey, A. Lacaita, G. Casagrande, P.

Cappelletti, and R. Bez, “Novel trench phase-change

memory cell for embedded and stand-alone non-volatile

memory applications”, to appear in Proc. 2004 Symposium on

VLSI Technology.

[4] G. Torelli and P. Lupi, “An improved method for

programming a word-erasable EEPROM”, Alta Frequenza,

vol. LII, pp. 487-494, Nov./Dec. 1983.

[5] V. N. Kynett, M. L. Fandrich, J. Anderson, P. Dix, O.

Jungroth, J. A. Kreifels, R. A. Lodenquai, B. Vajdic, S. Wells,

M. D. Winston, and L. Yang, “A 90-ns one million

erase/program cycle 1-Mbit Flash memory”, IEEE Journal of

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[6] F. Bedeschi, E. Bonizzoni, O. Khouri, C. Resta, and G. Torelli,

“A fully symmetrical sense amplifier for non-volatile

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[7] W. Y. Cho, B.-H. Cho, B.-G. Choi, H.-R. Oh, S.-B. Kang, K.-

S. Kim, K.-H. Kim, D.-E.Kim, C.-K. Kwak, H.-G. Byun, Y.-

N. Hwang, S.-J. Ahn, G.-T. Jung, H.-S. Jung, and K. Kim, “A

0.18 m 3.0 V 64Mb non-volatile phase-transition random-

access memory (PRAM)”, 2004 IEEE Solid-State Circuits

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