b1- interference lithography on curved surfaces · b1- interference lithography on curved surfaces...
TRANSCRIPT
Department of Mechanical Engineering
Institute of Micro- and Nanotechnologies
FG Technische Optik
Xinrui Cao, Prof. S. Sinzinger
Phone +49 3677 69-2489
Fax +49 3677 69-1281
www.tu-ilmenau.de/to
B1- Interference lithography on curved surfaces (Lau effect for optical lithography)
Theoretical and practical study on Lau effect - Optical coherence of illumination - Intensity distribution at variable grating separations - 3D filed distribution around the image planeApplication of Lau effect in lithographic structuring
Motivation
Experimental results and lithography
- Optical coherence of illumination for Lau effect
The project is funded by the DFG in the framework of Research Training group „Tip and laser-based 3D-Nanofabrication in extended macroscopic working areas“ (GRK 2182/1) at the Technische Universität Ilmenau, Germany.
- Intensity distribution in the image plane
- 3D field distribution around the image plane - Application of Lau effect in optical lithography
Fig.1: Setup of Lau effect
Fig.5: Lithographic structuring (light source: UV-LED)Fig.4: Intensity distribution around the
back focal plane of the Fourier lens (f=120mm)
Fig.2: Intensity image under (a) spatially coherentillumination, and (b) spatially incoherent illumination
Fig.3: Intensity distribution in the back focal plane ofthe Fourier lens (f=120mm) at variable grating separations