ascent ap (advanced pulsing) power supplies · 8/29/2018 · 2018 advanced energy industries, inc....
TRANSCRIPT
©2018 Advanced Energy Industries, Inc.
ASCENT AP (ADVANCED PULSING) POWER SUPPLIESUNPRECEDENTED POWER CONTROL FOR SINGLE- AND DUAL-MAGNETRON SPUTTERING
Power
30 kW (15 kW)
Voltage
1000 VDC
Average Current
75 A (38 A)
Frequency
0, 5 to 150 kHz
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ASCENT AP
Ascent AP (Advanced Pulsing) Power Supplies
AE disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-DC technology, providing unprecedented plasma control where only limited control previously existed. Ascent® AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation.
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ASCENT AP
Product Highlights Advanced waveform customization for expanded
access to power delivery parameters
Patented pulsing technology for remarkable arc prevention, higher power levels, and increased throughput
Compact, single-unit solution (up to 30 kW)
Set point compensation™ technology for stable throughput
Wide operational range to enable a variety of process materials
Precise sputtering of dielectric and conductive films
Single-magnetron and dual-magnetron configurations available
Extended process control, flexibility, and innovation
High film quality and throughput
Repeatable, customizable films
Higher power levels with reduced arc damage
Easy integration and control
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ASCENT AP
Single-Magnetron Sputtering of Reactive and Conductive Materials
Use as a single-magnetron sputtering supply or as a bias supply
A patented boost circuit on the leading edge of the sputtering waveform accelerates delivery of power to the process compared to a sine wave generator. The reverse portion of the waveform maximizes control, allowing more definitive charge clearing during reverse cycle.
Time (µsec)-10 -5 0 5 10 15 20 25 30 35 40
Volta
ge [V
]
-800
-600
-400
-200
0
200
400Plasma voltage and current
Waveform at the Plasma (Actual)Waveform at the Generator's Output
Cur
rent
[A]
-400
-300
-200
-100
0
100
200
Vboost
Tcross 2Tcross 1
Vprocess
Only if Icable > 0
t
Vout/Iout
Ipk
Iav
Vrev
Spu�ering Spu�eringCharge Clearing Charge Clearing
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ASCENT AP
Dual-Magnetron Sputtering of Reactive Materials and “Bi-Material Co-Sputtering”
Control power delivery to each magnetron independently for increased deposition rates and target utilization.
Waveform at the Generator's OutputWaveform at the Plasma (Actual)
Vboost
Vboost
Tcross 1
Vprocess
Vprocess
t
Iprocess
Ton (1)
Ton (2)
T=1/FreqTime (µsec)
0 20 40 60 80 100 120 140 160 180 200
Volta
ge [V
]
-800
-600
-400
-200
200
400
600
800
Cur
rren
t [V]
-120
-90
-60
-30
30
60
90
120
0 0
Tcross 2
Vout/Iout
Side A Side ASide B Side B
Ascent SMS AP Power Supply Ascent DMS AP Power Supply
Power 30 kW (15 kW) 30 kW (15 kW)
Voltage 1000 VDC 1000 VDC
Peak Current 100 A (50 A) N/A
Average Current 75 A (38 A) 75 A (38 A)
Frequency 0, 5 to 150 kHz 0, 5 to 150 kHz
Reverse Time (Max) 15 μsec N/A
Duty Cycle > 60% ON time 5 to 95%
Reverse Voltage 300 VDC max N/A
Pulse Configuration Unipolar Bipolar
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ASCENT AP
587.46
729.91
775.75
440.23
483.11
261.
33
587.46
729.91
775.75
440.23
483.11
261.
33
advanced-energy.com 7
ASCENT AP
587.46
729.91
775.75
440.23
483.11
261.
33
For international contact information, visit advanced-energy.com.
[email protected]+1 970 221 0108
ABOUT ADVANCED ENERGY
Advanced Energy (AE) has devoted more than three decades to perfecting power for its global customers. AE designs and manufactures highly engineered, precision power conversion, measurement and control solutions for mission-critical applications and processes.
AE’s power solutions enable customer innovation in complex semiconductor and industrial thin film plasma manufacturing processes, demanding high and low voltage applications, and temperature-critical thermal processes.
With deep applications know-how and responsive service and support across the globe, AE builds collaborative partnerships to meet rapid technological developments, propel growth for its customers and power the future of technology.
Specifications are subject to change without notice. Not responsible for errors or omissions. ©2018 Advanced Energy Industries, Inc. All rights reserved. Advanced Energy®, AE®, Ascent®, and Set Point Compensation™ are U.S. trademarks of Advanced Energy Industries, Inc.
ENG-ASCENTAP-231-04 4.18