argonne ald godparent review 10-01-10 v2
TRANSCRIPT
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Status of ALD MCP Program at Argonne
Anil Mane, Qing Peng, Joe Libera, Jeff Elam
LAPPD Project Second Microchannel Plate Godparent ReviewOctober 4, 2010
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Outline
New hardware Resistive coatings Emissive coatings Scale-up
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Work Plan and Deliverables
Year 1– Emissive coatings– Resistive coatings– Begin scale-up
Year 2– Stripe coating (“Dynode
Chain”)– Continue scale-up
Year 3– Produce tiles
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New Hardware: Measurement and Testing
Mercury probe – conductance of thin films in air, computer controlled
Shadow mask – measure lateral resistance of thin films
Vacuum setup – HV conductance and thermal
coefficient of MCPs
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New Hardware: MCP Gain Testing Setup
quartz window for UV
~10-7mbar vacuum
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Next: MCP mount, electronics, safety plan
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Frame with MCP
frame in rotary fixture
New Hardware: Electroding and Fixtures
frame in rotary fixture
Fixture 1 - ClausingFixture 2 - Fermilab
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New Hardware: Process Development and Scale-up
Large area reactor: substrate size12” x 18”, single 8” tile
Beneq TFS500Multiple 8” tiles (up to 40)
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Resistive Coatings: Al2O3/ZnO (AZO)
Good: existing process Bad: hard to control (etching of ZnO by
trimethyl aluminum precursor) Bad: big slope (105 resistance change over
10% composition change)etching
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Cross-Sectional Image of ALD Film in MCP
ALD Film
100 nm ALD film visible in middle of MCP 6 samples to testing group Testing: gain, then sparks
Glass
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Temperature Coefficient
109
1010
1011
1012
20 30 40 50 60 70 80
Res
ista
nce
(Ohm
s)
T(C)
Standard Glass MCP: βT=-0.02Micromachined silica MCP: βT=-0.036
20% AZO MCP: βT=-0.06
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Resistive coatings: MgO/ZnO (MZO)
11
No etching in MZO Resistance is tunable MgO is candidate for SEY layer No MCPs made yet with MZO
Thic
knes
s (A
ngst
rom
s)Quartz Microbalance Data:
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Patterned electrodes for testing ALD films:in-plane versus thru-film resistance
glass
ALD filmElectrode Pad
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Resistance of ALD AZO and MgZnO
Thru-film In planeAZO AZO
In plane resistivity ~x103-104 higher than thru-film (preliminary)
0.20ohm•cm2.29e2 ohm•cm
Thru-film In plane
26 ohm•cm2.64e5 ohm•cm
MgZnO
MgZnO
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Resistive Coatings: Chemistry 1
No etching Resistance is tunable, small slope (102 over 10%) βT=-0.027 Very reproducible (different locations, different batches) MCPs work: (20 micron, 60 L/D, 1x106 gain at 1200V) 11 MCPs to testing group
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SEM analysis of chemisty-1 coated MCP (d) Top surface low magnification, (e) top surface high magnification and (f) Cross-section of MCP.
a) Bare MCP b) After ALD c) After ALD + Cr electrode
(d) (e) (f)
Glass
resistive layer
Photographs of bare MCP(a), After ALD chemisty-1 coating (b) and after ALD chemisty-1 coating + 200nm Cr electrode (c).
Image taken from middle of MCP
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ALD resistive coating on MCP: Chemistry 1
• Uniform and smooth ALD coating pores of MCP
% of metal ALD cycles doping in oxide
1.E+06
1.E+08
1.E+10
1.E+12
1.E+14
5 10 15 20 25 30 35
Resis
tivity
(ohm
-cm
)
W % in Al2O3
Resistivity vs. % W in Al2O3 on MCP
Roughness•Maximum RMS roughness < 3%
AFM on planer substrate (Courtesy: Hau Wang)
10% 20% 30%
0.506nm 0.889nm 1.41nm
•Linear I-V on MCP
y = 1E-08x - 2E-09
-2.E-07
-1.E-07
-1.E-21
1.E-07
2.E-07
-10 -5 0 5 10
I(A)
V(V)
30% W in Al2O3
MCP
Workable resistivity range for 33mm MCP
y = 1E-08x - 2E-09
-2.E-07
-1.E-07
-1.E-21
1.E-07
2.E-07
-10 -5 0 5 10
I(A)
V(V)
30% W in Al2O3
MCP
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Reproducibility: ALD Chemistry 1
620
630
640
650
660
0 5 10 15 20
Thic
knes
s [A]
# of MCP
Thickness
Thickness on Si(100) Resistance
1.E+06
1.E+08
1.E+10
1.E+12
1.E+14
0 5 10 15 20
Resi
stan
ce (o
hm)
# of MCP
On GlassOn MCP
Composition AComposition B
Composition A Composition B
• Excellent reproducible thickness and resistance on Glass• Resistance variation on MCP cause by electrode variations (end spoiling not controlled)
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MCP resistance stability (air vs. vacuum) Chemistry 1
Vacuum break
I-V measured after 4 days
• Stable I-V response in vacuum
MCP# 122Photonis electrode first ++ ALD resistive chem-1 + SEE coating
R=150M at RT
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ALD coated MCP resistance stability in vacuum – Chemistry 1
• Very stable resistance performance with less than 5% resistance variation• I-V set-up upgrade in progress, will allow I-V testing for ~1.5kV
MCP# 122 Photonis electrode first + ALD resistive chem-1 + SEE coating
R=150 M
0 2 4 6 8 100
20
40
60
80
100
120
140
160
180
200M
CP
re
sist
an
ce (
M)
Time (days)
Resistance variation <5%
Data collected at constant 100V condition (heating of MCP?)
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1.E+00
1.E+03
1.E+06
1.E+09
1.E+12
1.E+15
0 5 10 15
Resis
tivity
(ohm
-cm
)
Mo % in Al2O3
Data on GlassResistivity of ALD coating on Glass: Chemistry #2
• Better control process than chemistry 1: uniform and smooth ALD coating• Similar resistivity range (like chemisty 1)• βT=-0.033• Process tested on large substrates capable ALD reactor
% of metal ALD cycles doping in oxide
•Linear I-V on Glass
Workable resistivity range for 33mm MCP
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@1200V
Phosphor image of ALD functionalized MCP with chemistry 2 and Al2O3 SEE layer
MPC works
(Ossy)
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Spacers resistance tuning by ALD
Tune spacer resistance using ALD resistive coatings
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Spacers resistance tuning by ALD (used Chemistry 1)
Total R = R1+R2+R3
Spacer 1Spacer 2 Spacer 3
Tota
l Res
ista
nce
(R1+
R2+R
3, Ω
)
Chem -1Compositon-1
Chem -1Compositon-2
Can tune spacer resistance using thickness and composition
In-situ resistance monitoring
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Emissive Coatings Substrates:
– Si(100) - conductive, smooth, flat, cheap– Photonis MCPs– ALD MCPs
Films:– Al2O3, MgO, SiO2, ZnO/Al2O3
– Diamond (UNCD) film awaiting test– 1-100 nm
~60 samples to characterization group
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ALD
No ALD
(Ossy)
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Process scale-up: Chemistry 2 in large area coater
12”x12” Glass
300mm Si wafer
For initial test, used same pressures and timings as small reactor
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Large substrate testing: ALD Chemistry #2
Item Thickness [A] Index of refraction (n)Minimum 775 1.72
Maximum 794 1.77
Average 785 1.73
% STDV (1σ) 0.57 0.84
Thickness Index of refractionLo
catio
n ac
ross
sub
stra
te
Location across substrate
-150 -100 -50 0 50 100 150-150
-100
-50
0
50
100
150
Y(m
m)
X (mm)
775.0
777.4
779.8
782.1
784.5
786.9
789.3
791.6
794.0
-150 -100 -50 0 50 100 150-150
-100
-50
0
50
100
150
Y(m
m)
X (mm)
1.715
1.722
1.730
1.737
1.744
1.751
1.759
1.766
1.773
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Scale-up
MCP Godparent Review Meeting 10-4-2010
First test: Al2O3 on 8”x8” capillary glass array
8”x8”MCP
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