are classical design flows suitable below 0.18 ? ispd 2001 nec electronics inc. wr0999.ppt-1...

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Are classical design flows suitable below 0.18? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

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Page 1: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

Are classical design flows suitable below

0.18?ISPD 2001

NEC Electronics Inc.NEC Electronics Inc.

WR0999.ppt-1

Wolfgang RoethigSenior Engineering Manager

EDA R&D Group

Page 2: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 2 of 10

Classical Design Approaches

Full-custom design

• hand-craft the design, transistor-level analysis

• time-consuming methodology, usable only for standard products

Low-end ASIC

• automated design process, huge margin to guarantee functionality

• fast TAT, yet sub-optimal use of process technology

High-end ASIC design must bridge the gap

• fast TAT through automation, yet more sophisticated tools

• aggressive design, but still sign-off guarantee

Page 3: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 3 of 10

New ASIC design issues

A VDSM design flow must solve all these issues

How to calculate and fix timing in the presence of crosstalk and noise?

How to check the entire design for localized voltage drops?

How to guarantee manufacturability by correct layout?

How to ensure reliability against electromigration and hot electron effects?

How to partition a complex SOC design into manageable blocks?

How to analyze and reduce chip power consumption?

Page 4: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 4 of 10

Example: crosstalkTwo signals on adjacent wires switch simultaneously

+ 20 % @ 0.5 mm+ 40 % @ 1 mm

double+ 0 % @ 1 mm+ 10 % @ 3 mm

+ 30 % @ 0.5 mm+ 40 % @ 1 mm

double+ 10 % @ 1 mm+ 30 % @ 3 mm

+ 70 % @ 0.5 mm+ 100 % @ 1 mm single

+ 10 % @ 1 mm+ 60 % @ 3 mm

+ 70 % @ 0.5 mm+ 100 % @ 1 mm single

+ 40 % @ 1 mm+ 90 % @ 3 mm

Delay increases up to 100% with single pitch

2x drive aggressor affects even 8x drive victim

Delay increases up to 40% even with double pitch

Significant effect even for 0.5 mm wire

delay % @ wire length (3rd metal in 0.18u)

victimaggressor

2x strength

8x strength

2x strength 8x strength routing pitch

Page 5: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 5 of 10

Example: power and current density

• Power consumption in 0.18 6 times higher than in 0.35

• Current density in 0.18 10 times higher than in 0.35

• Therefore dramatic increase in electromigration and voltage drop effects

max. # gates 6 Meg 12 Meg 34 Meg

power / gate / MHz 0.07 W 0.04 W 0.02 W

max. clock frequency 120 MHz 230 MHz 450 MHz

Power / Power(0.35) 1 2.2 6.12

supply voltage 3.3 V 2.5 V 1.8 V

Current / Current (0.35) 1 2.9 11.3

max. numbers are absolute technology limits

Technology 0.35 0.25 0.18

power = # gates x frequency x power / gate / MHz

current = power / supply voltage

Page 6: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 6 of 10

Reliability and Manufacturability• More complicated rules for design tools

Technology

0.35

0.25

0.18

0.13

Reliability Manufacturability

No design issue No design issue

Electromigration &hot electron checkfor cells

Global antenna rules

Layer-specificantenna rules

Electromigration &hot electron checkfor cells, avg. current limit

Layer-specificantenna rules andmetal density rules

Electromigration &hot electron check forcells and interconnect,avg. and peak currentlimit

Page 7: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 7 of 10

Consequences

• Signal integrity effects can not be handled in isolation

– crosstalk is the effect of multiple interacting signals

– voltage drop is a system-level effect

– reliability and manufacturability rules reduce the degrees of freedom for timing optimization

– timing affects xtalk and vice versa

– timing affects power and vice versa

• Design tools need to be signal-integrity literate

– coherent and concurrent design and analysis of all signal integrity effects is required

– transistor-level analysis is not feasible

– need higher level abstract analysis models

Page 8: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 8 of 10

Changing Design Environment

RTLRTL

SynthesisSynthesis

GateGate

PlacementPlacement

RoutingRouting

Timing checkTiming check

19980.25

2MG100MHz

GateGate

Physical SynthesisTiming OptimizationPhysical SynthesisTiming Optimization

RoutingRouting

RTLRTL

SynthesisSynthesis

20000.18

Signal Integrity Check&RepairSignal Integrity Check&Repair

10MG200MHz

Gate-level planningGate-level planning

20020.13

RTL PlanningRTL Planning

RTLRTL

30MG400MHz

Physical SynthesisTiming, Power,Signal IntegrityOptimization

Physical SynthesisTiming, Power,Signal IntegrityOptimization

RoutingSignal IntegrityCorrectness

RoutingSignal IntegrityCorrectness

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Page 9: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 9 of 10

Need for advanced library modeling• Design flow will need common or compatible analysis backplane

• Technology library and its components (cells, blocks, wires) need to be characterized

– timing and power are not sufficient

– crosstalk delay and noise, electromigration, hot electron effect, manufacturability must be described

• Models must be

– accurate for high performance ICs

– efficient for analysis and optimization

– suitable for designers (model specification) as well as for characterization, design and analysis tools (model usage)

• The Advanced Library Format (ALF) provides a solution

– Already proliferating in the industry

– Emerging IEEE standard (see www.eda.org)

Page 10: Are classical design flows suitable below 0.18  ? ISPD 2001 NEC Electronics Inc. WR0999.ppt-1 Wolfgang Roethig Senior Engineering Manager EDA R&D Group

ISPD panelApril 2 2001

Slide 10 of 10

Conclusion• Classical ASIC design flow is changing

– increasing complexity: hierarchical design

– decreasing geometry: signal integrity

• VDSM technology requires more aggressive design

– not enough room for guard bands: physics are too severe

– not enough time for manual work: designs are too large

• New generation of design tools and flows

– concurrent design and analysis for timing, power, signal integrity, manufacturability using advanced library models

• Merge of design flows

– SOC contains ASIC-style blocks and custom blocks

– Hierarchical design, analysis and optimization enabled by abstract models of the blocks