applications of synchrotron radiation techniques to materials...

Applications of SynchrotronRadiation Techniques to

Materials Science V

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Cambridge University Press978-1-107-41334-4 - Materials Research Society Symposium Proceedings: Volume 590:Applications of Synchrotron Radiation Techniques to Materials Science VEditors: Stuart R. Stock, Susan M. Mini and Dale L. PerryFrontmatterMore information

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MATERIALS RESEARCH SOCIETYSYMPOSIUM PROCEEDINGS VOLUME 590

Applications of SynchrotronRadiation Techniques to

Materials Science V

Symposium held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.

EDITORS:

Stuart R. StockGeorgia Institute of Technology

Atlanta, Georgia, U.S.A.

Susan ]VL MiniNorthern Illinois University

DeKalb, Illinois, U.S.A.and

Argonne National LaboratoryArgonne, Illinois, U.S.A.

Dale L. PerryLawrence Berkeley National Laboratory

Berkeley, California, U.S.A.

'MlRJSjMaterials Research Society

Warrendale, Pennsylvania






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CONTENTS

Preface xi

Acknowledgments xiii

Materials Research Society Symposium Proceedings xiv

SPECTROSCOPY

* X-ray Spectro-Microscopy and Micro-Spectroscopy in the 2100 eVto 12000 eV Region 3

N. Molders, P.J. Schilling, and J.M. Schoonmaker

*Surface Interactions of Actinide Ions With Geologic MaterialsStudied by XAFS 9

E.R. Sylwester, E.A. Hudson, and P.G. Allen

*In Situ XAFS of the LixNi0.8Coo.202 Cathode for Lithium-IonBatteries 17

A.J. Kropf and C.S. Johnson

*The Influence of Desulfovibrio Desulfuricans on NeptuniumChemistry 27

L. Soderholm, C.W. Williams, Mark R. Antonio,Monica Lee Tischler, and Michael Markos

Extracellular Iron-Sulfur Precipitates From Growth ofDesulfovibrio desulfuricans 33

Mark R. Antonio, Monica Lee Tischler, and Dana Witzcak

The Structure of Actinide Ions Exchanged into Native andModified Zeolites and Clays 39

Stephen R. Wasserman, L. Soderholm, and Daniel M. Giaquinta

EXAFS and Raman Studies of PTMGn:MCl2 and PTMG/PEGn:MCl2

Complexes (M = Co, Zn) 45C.A. Furtado, A.O. Porto, G.G. Silva, R.A. Silva, M.C. Martins Alves,P J. Schilling, and R. Tittsworth

* Invited Paper






Charge Transfer and Local Structure in ThermoelectricGermanium Clathrates 51

A.E.C. Palmqvist, B.B. Iversen, L.R. Furenlid, G.S. Nolas,D. Bryan, S. Latturner, and G.D. Stucky

A High-Resolution Angle-Resolved Photoemission Study of theTemperature Dependent Electronic Structure of thePentatelluride ZrTe5 57

D.N. Mcllroy, Daqing Zhang, Bradley Kempton, J. Wharton,R.T. Littleton, T.M. Tritt, and C.G. Olson

X-ray Absorption Characterization of Diesel ExhaustParticulates 63

A.J. Nelson, J.L. Ferreira, J.G. Reynolds, S.D. Schwab, andJ.W. Roos

XANES Analysis of bcc/fcc Two-Phase Binary Alloys 71P J. Schilling, R.C. Tittsworth, E. Ma, and J-H. He

Spectroscopic Characterization of Mixed Titania-SilicaXerogel Catalysts 77

M.A. Holland, D.M. Pickup, G. Mountjoy, S.C. Tsang,G.W. Wallidge, RJ. Newport, and M.E. Smith

Synchrotron-Based Studies of Transition Metal IncorporationInto Silica-Based Sol-Gel Materials 83

G. Mountjoy, D.M. Pickup, M.A. Holland, G.W. Wallidge,RJ. Newport, and M.E. Smith

SCATTERING AND DIFFRACTION

* An Inelastic Nuclear Resonant Scattering Study of PartialEntropies of Ordered and Disordered Fe3Al 91

B. Fultz, W. Sturhahn, T.S. Toellner, and E.E. Alp

*Interplay of Charge, Orbital and Magnetic Order in Pri_xCaxMnO3 103M. v. Zimmermann, J.P. Hill, Doon Gibbs, M. Blume, D. Casa,B. Keimer, Y. Murakami, Y. Tomioka, and Y. Tokura

* Invited Paper






Characterization of Mixed-Metal Oxides Using Synchrotron-BasedTime-Resolved X-ray Diffraction and X-ray AbsorptionSpectroscopy 113

Jose A. Rodriguez, Jonathan C. Hanson, Joaquin L. Brito,and Amitesh Maiti

In Situ Studies of the Processing of Sol-Gel Produced AmorphousMaterials Using XANES, SAXS and Curved Image Plate XRD 119

D.M. Pickup, G. Mountjoy, R.J. Newport, M.E. Smith,G.W. Wallidge, and M.A. Roberts

Diamond In-Line Monitors for Synchrotron Experiments 125P. Bergonzo, D. Tromson, A. Brambilla, C. Mer, B. Guizard,and F. Foulon

Anomalous Ultra-Small-Angle X-ray Scattering From EvolvingMicrostructures During Tensile Creep 131

P.R. Jemian, G.G. Long, F. Lofaj, and S.M. Wiederhorn

Synchrotron Small Angle X-ray Scattering Study of MeltCrystallized Polymers 137

Georgi Georgiev, Patrick Shuanghua Dai, Elizabeth Oyebode,Peggy Cebe, and Malcolm Capel

Maximum Entropy Method Charge Density Distributions ofNovel Thermoelectric Clathrates 145

B. Iversen, A. Bentien, A. Palmqvist, D. Bryan, S. Latturner,G.D. Stucky, N. Blake, H. Metiu, G.S. Nolas, and D. Cox

High Real-Space Resolution Structure of Materials by High-EnergyX-ray Diffraction 151

V. Petkov, S.J.L. Billinge, J. Heising, M.G. Kanatzidis,S.D. Shastri, and S. Kycia

Synchrotron X-ray Study of Elastic Phase Strains in the Bulk of anExternally Loaded Cu/Mo Composite 157

A. Wanner and D.C. Dunand






SURFACES

*X-ray Surface Scattering Studies of Molecular Ordering atLiquid-Liquid Interfaces 165

Mark L. Schlossman, Ming Li, Dragoslav M. Mitrinovic,and Aleksey M. Tikhonov

The Incorporation of Lung Surfactant Specific Protein SP-BInto Lipid Monolayers at the Air-Fluid Interface: A GrazingIncidence X-ray Diffraction Study 177

K.Y.C. Lee, J. Majewski, T.L. Kuhl, P.B. Howes, K. Kjaer,M.M. Lipp, A.J. Waring, J.A. Zasadzinski, and G.S. Smith

Resonant X-ray Scattering From the Surface of a Dilute LiquidHg-Au Alloy 183

E. DiMasi, H. Tostmann, B.M. Ocko, P. Huber, O.G. Shpyrko,P.S. Pershan, M. Deutsch, and L.E. Berman

Experimental Investigations of the Interaction of SO2 with MgO 189Andrea Freitag, J.A. Rodriguez, and J.Z. Larese

Synchrotron X-ray Scattering Study on Oxidation of AIN/Sapphire 195H.C. Kang, S.H. Seo, and D.Y. Noh

Study of the Buried Interface Behavior of Liquid Crystal Thin FilmsUsing Synchrotron Radiation and Grazing Incidence X-rayScattering Mode 201

Y. Hu and L.J. Martinez-Miranda

Investigation of Inhomogeneous In-Plane Strain Relaxation in Si/SiGeQuantum Wires by High Resolution X-ray Diffraction 207

Y. Zhuang, C. Schelling, T. Roch, A. Daniel, F. Schaffler,G. Bauer, J. Grenzer, U. Pietsch, and S. Senz

Structure of the Near-Surface Waveguide Layers Produced by Diffusionof Titanium in Lithium Niobate 213

Y. Avrahami, E. Zolotoyabko, W. Sauer, T.H. Metzger, andJ. Peisl

Structural Characterization Using Synchrotron Radiation of OxideFilms and Multilayers Grown by MOCVD 219

C. Dubourdieu, J. Lindner, M. Audier, M. Rosina, F. Weiss,J.P. Senateur, J.L. Hodeau, E. Dooryhee, and J.F. Berar

* Invited Paper






MICROBEAM DIFFRACTION, MICROTOMOGRAPHY,TOPOGRAPHY

*Plastic Deformation and Recrystallization Studied by the 3-D X-rayMicroscope 227

D. Juul Jensen, A. Kvick, E.M. Lauridsen, U. Lienert,L. Margulies, and S.F. Nielsen, and H.F. Poulsen

High Spatial Resolution Strain Measurements Within BulkMaterials by Slit-Imaging 241

U. Lienert, R. Martins, S. Grigull, M. Pinkerton, H.F. Poulsen,and A. Kvick

3-D Measurement of Deformation Microstructure in Al(0.2%)MgUsing Submicron Resolution White X-ray Microbeams 247

B.C. Larson, N. Tamura, J-S. Chung, G.E. Ice, J.D. Budai,J.Z. Tischler, W. Yang, H. Weiland, and W.P. Lowe

Nondestructive Determination of the Depth of Different TextureComponents in Polycrystalline Samples 253

C.R. Patterson II, K.I. Ignatiev, A. Guvenilir, J.D. Haase,R. Morano, Z.U. Rek, and S.R. Stock

Synchrotron Radiation X-ray Microdiffraction Study of Cu Interconnects 259X. Zhang, H. Solak, F. Cerrina, B. Lai, Z. Cai, P. Ilinski, D. Legnini,and W. Rodrigues

Attenuation- and Phase-Contrast Microtomography Using SynchrotronRadiation for the 3-D Investigation of Specimens Consistingof Elements With Low and Medium Absorption 265

F. Beckmann and U. Bonse

X-ray Phase Contrast Imaging Study of Activated Carbon/CarbonComposite 273

Kenji Kobayashi, Koichi Izumi, Hidekazu Kimura,Shigeru Kimura, Tomoaki Ohira, Takashi Saito, Yukari Kibi,Takashi Ibuki, Kengo Takai, Yoshiyiki Tsusaka, Yasushi Kagoshima,and Junji Matsui

X-ray Topography Study of Surface Damage in Single-Crystal Sapphire 279D. Black, R. Polvani, K. Medicus, and H. Burdette

* Invited Paper






Keys to the Enhanced Performance of Mercuric Iodide RadiationDetectors Provided by Diffraction Imaging 285

Bruce Steiner, Lodewijk van den Berg, and Uri Laor

Dislocation Motion Around Loaded Notches in Ice Single Crystals 291D. Cullen, X. Hu, I. Baker, and M. Dudley

Growth Twins in YbxYi_xAl3(BO5)4 and NdxGdi_xAl(BO3)4 CrystalsObserved by White-Beam Synchrotron Radiation Topography 297

X.B. Hu, J.Y. Wang, M. Guo, S.R. Zhao, B. Gong, J.Q. Wei,and Y.G. Liu

Author Index 303

Subject Index 307






PREFACE

This volume is a collection of papers presented at Symposium R, "Applications ofSynchrotron Radiation Techniques to Materials Science V," held November 29-December 3 atthe 1999 MRS Fall Meeting in Boston, Massachusetts. The symposium brought together thematerials science community and the characterization techniques that use synchrotronradiation, much like the earlier MRS symposia on this topic (MRS Symposium ProceedingsVolume 143, 1988 Fall Meeting, edited by R. Clarke, J. Gland, and J.H. Weaver; Volume 307,1993 MRS Spring Meeting, edited by D.L. Perry, N.D. Shinn, R.L. Stockbauer, K.L. D'Amico,and L.J. Terminello; Volume 375, 1994 MRS Fall Meeting, edited by L.J. Terminello, N.D.Shinn, G.E. Ice, K.L. D'Amico, and D.L. Perry; Volume 437, 1996 MRS Spring Meeting, editedby L.J. Terminello, S.M. Mini, H. Ade, and D.L. Perry; Volume 524, 1998 MRS SpringMeeting, edited by S.M. Mini, S.R. Stock, D.L. Perry, and L.J. Terminello).

Each year, synchrotron facilities, both in the United States and in other countries, areutilized for more applications of synchrotron radiation as they pertain to materials science.Both basic and applied research possibilities are manyfold, including studies of materialsmentioned below and those that are yet to be discovered. The combination of synchrotron-based spectroscopic techniques with ever-increasing high-resolution microscopy allowsresearchers to study very small domains of materials in an attempt to understand theirchemical and electronic properties. This is especially important for composites and relatedmaterials involving material bonding interfaces.

Topics covered in this proceedings include surfaces, interfaces, electronic materials, metaloxides, metal sulfides, radiation detector materials, thin films, carbides, polymers, alloys,nanoparticles, and metal composites. Results reported at this symposium relate recentadvances in x-ray absorption and scattering, imaging, tomography, microscopy, and diffractionmethods.

Recently, Professor J.B. Cohen, a strong advocate for the materials synchrotron radiationcommunity, died suddenly. He planned a full-time return to teaching and research after over adecade of carrying heavy administrative burdens. He will be missed by the entire materialscommunity, not just those of us working with synchrotron radiation. As an acknowledgment ofhis leadership, the editors of this volume dedicate it to his memory.

Stuart R. StockSusan M. MiniDale L. Perry

January 2000






ACKNOWLEDGMENTS

The symposium organizers wish to thank the following for funding used to support thisendeavor:

Blake Industries

Lawrence Livermore National LaboratoryChemistry and Materials Science Department

Northern Illinois UniversityThe Graduate School and the College of Liberal

Arts and Sciences

The organizers also wish to thank the session chairs (Dale E. Alexander, Paul Fenter,Tony W.H. van Buuren, Uta Ruett, Mark R. Antonio, Stephen R. Wasserman, Debra R.Rolison, and Paul J. Schilling), and the symposium assistant, Cora Lind, who generously gaveof their time to make the event so successful, as well as Marlene White for her help inpreparing the manuscript for publication.






MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

Volume 557— Amorphous and Heterogeneous Silicon Thin Films: Fundamentals toDevices—1999, H.M. Branz, R.W. Collins, H. Okamoto, S. Guha, R. Schropp,1999, ISBN: 1-55899-464-5

Volume 558— Flat-Panel Displays and Sensors—Principles, Materials and Processes, F.R. Libsch,B. Chalamala, R. Friend, T. Jackson, H. Ohshima, 2000, ISBN: 1-55899-465-3

Volume 559— Liquid Crystal Materials and Devices, T.J. Bunning, S.H. Chen, L.C. Chien,T. Kajiyama, N. Koide, S-C.A. Lien, 1999, ISBN: 1-55899-466-1

Volume 560— Luminescent Materials, J. McKittrick, B. DiBartolo, K. Mishra, 1999,ISBN: 1-55899-467-X

Volume 561— Organic nonlinear Optical Materials and Devices, B. Kippelen, H.S. Lackritz,R.O. Claus, 1999, ISBN: 1-55899-468-8

Volume 562— Polycrystalline Metal and Magnetic Thin Films, D.E. Laughlin, K.P. Rodbell,O. Thomas, B. Zhang, 1999, ISBN: 1-55899-469-6

Volume 563— Materials Reliability in Microelectronics IX, C.A. Volkert, A.H. Verbruggen,D.D. Brown, 1999, ISBN: 1-55899-470-X

Volume 564— Advanced Interconnects and Contacts, D.C. Edelstein, T. Kikkawa, M.C. Ozturk,K-N. Tu, E.J. Weitzman, 1999, ISBN: 1-55899-471-8

Volume 565— Low-Dielectric Constant Materials V, J. Hummel, K. Endo, W.W. Lee, M. Mills,S-Q. Wang, 1999, ISBN: 1-55899-472-6

Volume 566— Chemical-Mechanical Polishing—Fundamentals and Challenges, S.V. Babu,S. Danyluk, M. Krishnan, M. Tsujimura, 2000, ISBN: 1-55899-473-4

Volume 567— Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics, H.R. Huff,C.A. Richter, M.L. Green, G. Lucovsky, T. Hattori, 1999, ISBN: 1-55899-474-2

Volume 568— Si Front-End Processing—Physics and Technology of Dopant-Defect Interactions,H-J.L. Gossmann, T.E. Haynes, M.E. Law, A.N. Larsen, S. Odanaka, 1999,ISBN: 1-55899-475-0

Volume 569— In Situ Process Diagnostics and Modelling, O. Auciello, A.R. Krauss, E.A. Irene,J.A. Schultz, 1999, ISBN: 1-55899-476-9

Volume 570— Epitaxial Growth, A-L. Barabasi, M. Krishnamurthy, F. Liu, T.P. Pearsall, 1999,ISBN: 1-55899-477-7

Volume 571— Semiconductor Quantum Dots, S.C. Moss, D. Ha, H.W.H. Lee, D.J. Norris, 2000,ISBN: 1-55899-478-5

Volume 572— Wide-Bandgap Semiconductors for High-Power, High-Frequency andHigh-Temperature Applications—1999, S.C. Binari, A.A. Burk, M.R. Melloch,C. Nguyen, 1999, ISBN: 1-55899-479-3

Volume 573— Compound Semiconductor Surface Passivation and Novel Device Processing,H. Hasegawa, M. Hong, Z.H. Lu, S.J. Pearton, 1999, ISBN: 1-55899-480-7

Volume 574— Multicomponent Oxide Films for Electronics, M.E. Hawley, D.H.A. Blank, C-B. Eom,D.G. Schlom, S.K. Streiffer, 1999, ISBN: 1-55899-481-5

Volume 575— New Materials for Batteries and Fuel Cells, D.H. Doughty, L.F. Nazar, M. Arakawa,H-P. Brack, K. Naoi, 2000, ISBN: 1-55899-482-3

Volume 576— Organic/Inorganic Hybrid Materials II, L.C. Klein, L.F. Francis, M.R. DeGuire,J.E. Mark, 1999, ISBN: 1-55899-483-1

Volume 577— Advanced Hard and Soft Magnetic Materials, M. Coey, L.H. Lewis, B-M. Ma,T. Schrefl, L. Schultz, J. Fidler, V.G. Harris, R. Hasegawa, A. Inoue, M.E. McHenry,1999, ISBN: 1-55899-485-8

Volume 578— Multiscale Phenomena in Materials—Experiments and Modeling, D.H. Lassila,I.M. Robertson, R. Phillips, B. Devincre, 2000, ISBN: 1-55899-486-6

Volume 579— The Optical Properties of Materials, J.R. Chelikowsky, S.G. Louie, G. Martinez,E.L. Shirley, 2000, ISBN: 1-55899-487-4

Volume 580— Nucleation and Growth Processes in Materials, A. Gonis, P.E.A. Turchi, A.J. Ardell,2000, ISBN: 1-55899-488-2

Volume 581— Nanophase and Nanocomposite Materials HI, S. Komarneni, J.C. Parker, H. Hahn,2000, ISBN: 1-55899-489-0

Volume 582— Molecular Electronics, S.T. Pantelides, M.A. Reed, J. Murday, A. Aviram, 2000,ISBN: 1-55899-490-4






MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

Volume 583— Self-Organized Processes in Semiconductor Alloys, A. Mascarenhas, B. Joyce,T. Suzuki, D. Follstaedt, 2000, ISBN: 1-55899-491-2

Volume 584— Materials Issues and Modeling for Device Nanofabrication, L. Merhari, L.T. Wille,K. Qonsalves, M.F. Qyure, S. Matsui, L.J. Whitman, 2000, ISBN: 1-55899-492-0

Volume 585— Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth andProcessing, S. Moss, E.H. Chason, B.H. Cooper, T. Diaz de la Rubia, J.M.E. Harper,R. Murti, 2000, ISBN: 1-55899-493-9

Volume 586— Interfacial Engineering for Optimized Properties II, C.B. Carter, E.L. Hall,C.L. Briant, S. Nutt, 2000, ISBN: 1-55899-494-7

Volume 587— Substrate Engineering—Paving the Way to Epitaxy, D.P. Norton, D.Q. Schlom,N. Newman, D.H. Matthiesen, 2000, ISBN: 1-55899-495-5

Volume 588— Optical Microstructural Characterization of Semiconductors, J. Piqueras,T. Sekiguchi, M.S. Unlu, N.M. Kalkhoran, 2000, ISBN: 1-55899-496-3

Volume 589— Advances in Materials Problem Solving with the Electron Microscope, J. Bentley,U. Dahmen, C. Allen, I. Petrov, 2000, ISBN: 1-55899-497-1

Volume 590— Applications of Synchrotron Radiation Techniques to Materials Science V,S.R. Stock, D.L. Perry, S.M. Mini, 2000, ISBN: 1-55899-498-X

Volume 591— Nondestructive Methods for Materials Characterization, T. Matikas, N. Meyendorf,Q. Baaklini, R. Gilmore, 2000, ISBN: 1-55899-499-8

Volume 592— Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon andRelated Structures, H.J. von Bardeleben, D.A. Buchanan, A.H. Edwards, T. Hattori,2000, ISBN: 1-55899-500-5

Volume 593— Amorphous and Nanostructured Carbon, J. Robertson, J.P. Sullivan, O. Zhou,T.B. Allen, B.F. Coll, 2000, ISBN: 1-55899-501-3

Volume 594— Thin Films—Stresses and Mechanical Properties VIII, R. Vinci, O. Kraft, N. Moody,P. Besser, E. Shaffer II, 2000, ISBN: 1-55899-502-1

Volume 595— GaN and Related Alloys—1999, R. Feenstra, T. Myers, M.S. Shur, H. Amano, 2000,ISBN: 1-55899-503-X

Volume 596— Ferroelectric Thin Films VIII, R.W. Schwartz, S.R. Summerfelt, P.C. Mclntyre,Y. Miyasaka, D. Wouters, 2000, ISBN: 1-55899-504-8

Volume 597— Thin Films for Optical Waveguide Devices and Materials for Optical Limiting,K. Nashimoto, B.W. Wessels, J. Shmulovich, A.K-Y. Jen, K. Lewis, R. Pachter,R. Sutherland, J. Perry, 2000, ISBN: 1-55899-505-6

Volume 598— Electrical, Optical, and Magnetic Properties of Organic Solid-StateMaterials V, S.P. Ermer, J.R. Reynolds, J.W. Perry, A.K-Y. Jen, Z. Bao, 2000,ISBN: 1-55899-506-4

Volume 599— Mineralization in Natural and Synthetic Biomaterials, P. Li, P. Calvert, R.J. Levy,T. Kokubo, C.R. Scheid, 2000, ISBN: 1-55899-507-2

Volume 600— Electroactive Polymers, Q.M. Zhang, T. Furukawa, Y. Bar-Cohen, J. Scheinbeim,2000, ISBN: 1-55899-508-0

Volume 601— Superplasticity—Current Status and Future Potential, P.B. Berbon, M.Z. Berbon,T. Sakuma, T.G. Langdon, 2000, ISBN: 1-55899-509-9

Volume 602— Magnetoresistive Oxides and Related Materials, M. Rzchowski, M. Kawasaki,A.J. Millis, M. Rajeswari, S. von Molnar, 2000, ISBN: 1-55899-510-2

Volume 603— Materials Issues for Tunable RF and Microwave Devices, Q. Jia, F.A. Miranda,D.E. Oates, X. Xi, 2000, ISBN: 1-55899-511-0

Volume 604— Materials for Smart Systems III, M. Wun-Fogle, K. Uchino, Y. Ito, R. Gotthardt,2000, ISBN: 1-55899-512-9

Volume 605— Materials Science of Microelectromechanical Systems (MEMS) Devices II,M.P. deBoer, A.H. Heuer, S.J. Jacobs, E. Peeters, 2000, ISBN: 1-55899-513-7

Volume 606— Chemical Processing of Dielectrics, Insulators and Electronic Ceramics, A.C. Jones,J. Veteran, S. Kaushal, D. Mullin, R. Cooper, 2000, ISBN: 1-55899-514-5

Volume 607— Infrared Applications of Semiconductors HI, B.J.H. Stadler, M.O. Manasreh,I. Ferguson, Y-H. Zhang, 2000, ISBN: 1-55899-515-3

Volume 608— Scientific Basis for Nuclear Waste Management XXIII, R.W. Smith, D.W. Shoesmith,2000, ISBN: 1-55899-516-1

Prior Materials Research Society Symposium Proceedings available by contacting Materials Research Society






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