vlsi chip making singular feature
Post on 08-Mar-2015
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TRANSCRIPT
PRESENTED BY:
Y.L.REVATHIV.HARSHA SRI
ABSTRACT
INTRODUCTION
FRONT END CONSTRUCTION OF COMPONENTS
BACK END – ADDING THE CONNECTING WIRES ADVANTAGES OF SINGLE FEATURE OVER BATCH PROCESS
CONCLUSION
VLSI – Very Large Scale Integration(10^5 -10^7)
VLSI design started in 1978. Today one of these 300-mm wafers can yield more than 700 Ics
Early process is the batch process where there is over production of chips.
In this paper the IC fabrication steps are given in brief. Batch process and the Single wafer process are compared in detail
Batch process
Singular process
Now 300mm wafers can yield more than 700 Ics.
ICs are manufactured with one wafer at a time process(Singular process) ) rather than many wafers at a time process(Batch Process)
Chip production today in detail
The number of transistors per chip will double for every 18 months
Steps for making components of the chip:
Construction Plan
Mask with circuit patterns
pure silicon crystal is grown
cutting and polishing
Covering with layer of silicon oxide
Placing protective material
Passing UV light
Etching
Doping
Steps for adding metal and connecting components
Metallization
Adding photo resist
Adding mask layer
Removing photo resist
Removing metal
Need of metal layer for connections
Testing
Separating chips from wafer
More good chips
Equipment is smaller
Uniform properties to all Ics
Maintains thickness of SiO2
Economically advantageous
Costs less
Hence single wafer process is adopted rather than batch process. IC manufacturers can plan their production very well with single wafer process.
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