there's plenty of room at the bottom 12/29/1959

1Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

There's Plenty of Room at the Bottom

12/29/1959Feynman asked why not put the entire Encyclopedia Britannica (24 volumes) on a pin head (requires atomic scale recording).

He proposed to use electron microscope to “write” the words, and to “read” the words.

He also thought that biological systems were already writing and reading information at the molecular (or nano) scale.

2Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

The Nanometer Sizescale

Nanotube

3Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Fabrication Techniques for Nano-Scale Structures

• ‘Top-down” Approaches– Lithography (E-beam,EUV)– Nano Imprint– Dip-Pen Nanolithography

• ‘Bottom-up' Approaches– Selective growth – Self-assembly – Scanning Tip Manipulation

4Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06 e-beam lithography resolution factors

• beam quality ( ~1 nm)

• secondary electrons ( lateral range: few nm)

performance records

organic resist PMMA ~ 7 nm

inorganic resist, b.v. AlF3 ~ 1-2 nm

5Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

The benchmark of Top-down Approach5nm-Gate Nanowire FinFET

2004 Symposium on VLSI Technology, p.196

6Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Technology Gap for Top-Down Approach

7Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

How to make a single-Crystal Si Nanowire

8Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Y.Ono et al., “Si complementary single-electron inverter”, IEDM, pp.367-370, 1999

Oxidation rate slows down withmechanical stress induced by surrounding oxide

Si Nanowire by thermal oxidation

9Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Prober et al, APL, 94 (1980)

30-nm wire fabrication by directional thin-film deposition

Triangular cross-section

Rectangular cross-section

10Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

dummystep

SiO2Si

Substrate

dummystep

SiO2Si

Substrate

SiO2Si

Substrate

SiO2

Substrate

Conformal CVD film 10-20nm spacer

Spaceras etching mask

Sidewall Spacer to define nm wires

nm Si

~10nm

(1) (2)

(3) (4)

11Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Twin nanowiresWith anisotropic etching of SOI

12Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

• Sacrificial layer method, deposition method, etc.• Cheaper and mass-productable methods• Soft mat’l vs. hard mat’l

Tas et al., Nano Letters, 2, 1031 (2002)

Nanochannel fabrication

13Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

www.nanonex.com

14Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

D. Piner, J. Zhu, F. Xu, and S. Hong, C. A. Mirkin, "Dip-Pen Nanolithography", Science, 1999, 283, 661–63.

* as small as 15 nm linewidths and ~5 nm spatial resolution

Dip-Pen Nanolithography

15Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Cutting window through a thin layer of Si oxide

Line dose: 3.3, 2.5, and 1.7 x 10-3 C/cm,

for the three lines from top to bottom;

“Local” E-beam

Etching an 8-nm Ag thin film

on Si(100) using the LEEB/STM

16Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

By E-Beam

17Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Growth Modes

* Au nanoparticles as catalyst

Nanowire Growth byVapor-Liquid-Solid Method

18Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

1D Functional HeterojunctionsLOHNs

• NanoElectronics•Thermoelectrics

COHNs

•NanoOptics•NanoFludics

Nanotape

•Selective sensors

Si/SiGe AlGaN/GaNTiO2/SnO2GaN/AlGaN

Prof. P. Yang, Chemistry

19Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

20Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Step Coverage(Al2O3)

21Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Chemical Modification of Single Walled Nanotubes

22Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Silicon probe with a conductive single walled carbon nanotube (<2 nm diameter). The tip is at the end of a flexible cantilever designed for the atomic force microscope.

http://www.media.mit.edu/nanoscale/research/sensors.html

A nanotube-bundle tip was used as thenegative electrode to locally oxidize silicon and write the oxide pattern ‘C-Tube’. OH- ions (from condensed H2O on tip) are driven by the strong field into the solid and induce the oxidation by reacting with Si holes in bulk Si.

23Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

http://www.almaden.ibm.com:80/vis/stm/gallery.html

Title : Carbon Monoxide Man

Media : Carbon Monoxide on Platinum (111)

Title: Atom

Media: Iron on Copper (111)

24Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06Probe Manipulation Technique

25Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

The smallest transistor

-60 -40 -20 0 20 40 60

-200

-100

0

100

I (pA

)

Vsd(mV)

Vg = 6.4 VVg = 6.9 VVg = 7.4 VVg = 7.7 V

Operation onlyat low temp

26Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Potassium Doping of CNT (n-type)

Javey et al, Nano Lett. 2005

27Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Field Assisted Assembly

metallic particle+-V +V

Long-range forces attract nanowires to substrate

particle moves in gradientof field towards region of

highest field strength

dielectric medium

Theresa MayerEE Dept.

28Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Field Assisted Assembly

Nanowires attracted and aligned totop electrodes

Alignment process is self limiting

SiO2+V -V

+ -

∆V = 0V

Siliconsubstrate

SiO2+V -V

+

-

29Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

•Nanowires serve dual purpose: both active devices andinterconnects.•All key nanoscale metrics are defined during synthesis andsubsequent assembly.•Crossed nanowire architecture provides natural scaling andpotential for integration at highest densities. •No additional complexity (with added material).

Crossed Nanowire Architecture

30Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

E-field Enhanced Fluidic Alignment

31Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Surface Programmed Assembly M. Lee et al Seoul National Univ 2004

32Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06Logic Gates and Computation from Assembled NanowireBuilding Blocks

Huang et al, SCIENCE VOL 294 9 NOVEMBER 2001

*p-Si and n-GaN NWs

The OR and AND gates has no signal gain

AssemblyY. Huang,, Science 291,630 (2001).

33Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Applied Physics Letters, 82 2491(2003)

Carbon Nanotube Interconnects

34Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Empirical : Resolution (in Å) ~ 23 Areal Throughput (in µm2/hr) 0.2

35Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Principle and Practice of Top-Down Integration

* A sequence of Additive and Subtractive steps with lateral patterning

•Planarization is used to control critical dimensions (lithography, etching, and thin-film deposition)•Self-aligned structure used whenever possible•Alignment is done for ALL lithography steps (registration marksalways available on substrate)

Si wafer

ProcessingSteps

36Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

Grand Challenges of The Bottom Up Approach

Bocheva et al, PNAS April 16, 2002 vol. 99 no. 8 4937–4940

What is the optimum functional building block using self-assembly ?

How do we align the different functional blocks for integration ?

- Alignment marks- 2D or 3D alignment

37Professor N Cheung, U.C. Berkeley

Lecture 26EE143 S06

0.001

0.01

0.1

1

10

100

0 10 20 30 40

curr

ent (

nA)

time (min)

A)

Light Emitting Sensing Magnetic Assembly

Wavelength Conversion

Thermoelectronics BimorphMechanics

Catalysis

20 nm

Finite size effect.. Chemical/thermal stability issue for devices

Interface/complexity/functionalityThe integration issue: nano-micro-macro continuum.