itrs winter conference 2010 makuhari, japan work in progress: not for distribution 2010 itrs...
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ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
2010 ITRS
Emerging Research Materials
[ERM]
December 3, 2010
Michael Garner – IntelDaniel Herr – SRC
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
2010 ERM ParticipantsHiro Akinaga AISTJesus de Alamo MITTsuneya Ando Tokyo Inst. Tech Dimitri Antoniadis MITNobuo Aoi PanasonicKoyu Asai RenesasAsen Asenov U. of GlasgowYuji Awano Keio UnivDavid AwschalomUCSB.Kaustav Banerjee UCSBDaniel-Camille Bensahel ST MicroStacey Bent Stanford U.Kris Bertness NISTBill Bottoms NanonexusGeorge Bourianoff IntelRod Bowman SeagateAlex Bratkovski HPRobert Bristol IntelBernard Capraro IntelJohn Carruthers Port. State Univ.
An Chen Global Foundry
Eugene Chen Grandis
Zhihong Chen IBM
Toyohiro Chikyo NIMS
Byung Jin Cho KAIST
U-In Chung Samsung
Luigi Colombo TI
Hongjie Dai Stanford U.
Thibaut Devolder Univ. Paris Sud
Athanasios Dimoulas IMS GreeceCatherine Dubourdieu L. Mat. Genie Phys. & IBMJohn Ekerdt U. of TexasTetsuo Endoh Tohoku Univ.James Engstrom Cornell U.
Michael Flatte U. IowaSatoshi Fujimura TOKMichael Garner Intel Niti Goel IntelMichael GoldsteinIntelSuresh Golwalkar IntelWilfried Haensch IBMDan Herr SRCHiro Hibino NTT
Bill Hinsberg IBM
Judy Hoyt MIT
Jim Hutchby SRC
Ajey Jacob Intel
David Jamieson U. Melbourne
Ali Javey U.C. BerkeleyJames Jewett IntelBerry Jonker NRLXavier Joyeux IntelTed Kamins ConsultantZia Karim AIXTRON AG Takashi Kariya IbidenMasashi Kawaski Tohoku U.Leo Kenny IntelPhilip Kim Columbia U.Sean King IntelAtsuhiro Kinoshita ToshibaMichael Kozicki ASUMark Kryder CMUYi-Sha Ku ITRIHiroshi Kumigashira U. TokyoY.J. Lee Nat. Nano Lab TWLiew Yun Fook A-StarWei-Chung Lo ITRILouis Lome IDA Cons.Gerry Lucovsky NCSUMark Lundstrom Purdue U.Yale Ma SeagateBlanka Magyari-Kope Stanford U.Allan MacDonald Univ. of Texas
Prashant Majhi IntelWitek Maszara Global FoundryFrancois Martin LETIFumihiro Matsukura Tohoku U.Nobuyuki Matsuzawa SonyJennifer Mckenna IntelClaudia Mewes U. AlabamaYoshiyuki Miyamoto NECAndrea Morello UNSWBoris Naydenov U. StuttgartPaul Nealey U. Wisc.Kwok Ng SRCFumiyuki Nihey NECYoshio Nishi Stanford U.Dmitri Nikonov IntelYaw Obeng NISTChris Ober Cornell UnivKatsumi Ohmori. TOKYoshichika Otani Riken Inst.Jeff Peterson IntelAlexei Preobrajenski Lund Univ.Victor Pushparaj AMATGanapati Ramanath RPI Ramamoorthy Ramesh U.C. BerkeleyNachiket Raravikar IntelHeike Riel IBMDave Roberts NanteroMark Rodwell UCSBSven Rogge Delft U.Jae Sung Roh HynixTadashi Sakai ToshibaGurtej Sandhu MicronKrishna Saraswat Stanford U.Hideyki Sasaki Toshiba NanoanalysisShintaro Sato AISTAkihito Sawa AISTBarry Schechtman INSECThomas Schenkel LBNLSadasivan Shankar Intel
Mizuki Sekiya AISTMatt Shaw IntelTakahiro Shinada Waseda Univ.Michelle Simmons UNSWKaushal Singh AMATJon Slaughter EverspinBruce Smith RITTsung-Tsan Su ITRIMaki Suemitsu Tohoku U.Naoyuki Sugiyama TorayC-Y Sung IBMRaja Swaminathan IntelMichiharu Tabe Shizuoka U.Hidenori Takagi U. of TokyoShin-ichi Takagi U. of TokyoKoki Tamura TOK AmericaIan Thayne U. of GlasgowYoshihiro Todokoro NAISTYasuhide Tomioka AISTMark Tuominen U. MassPeter Trefonas DowMing-Jinn Tsai ITRIWilman Tsai Intel Ken Uchida Tokyo TechYasuo Wada Toyo UVijay Wakharkar IntelKang Wang UCLARainer Waser Aacken Univ.Jeff Welser IBM/NRIC.P. Wong GA Tech. Univ.H.S. Philip Wong Stanford U.Dirk Wouters IMECWen-Li Wu NISTHiroshi Yamaguchi NTTToru Yamaguchi NTTChin-Tien Yang ITRIHiroaki Yoda ToshibaJiro Yugami RenasasSC Zhang Stanford U.Yuegang Zhang LBNLVictor Zhirnov SRCPaul Zimmerman Intel
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
2010 Key Messages
• 2010: No Updates in ERM Chapter• Preparation for 2011 ERM Chapter
– Updating Material Progress– Critical Assessments of ERM– Identifying New ITWG Requirements for ERM – Transition Mature Materials to ITWGs– Workshops
• Memory Materials Workshop: Completed• Directed Self Assembly Litho Applications• Deterministic Doping: Completed• e-Workshops
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Extending CMOS Alternate Channel Materials
Alternate Channel Materials
-Ge & III-V Compounds(Transition to FEP & PIDS)
-Nanowires
-Graphene
-Carbon Nanotubes
III-V Heterostructures(L. Samuelson, Lund Univ.)
A. Geim, Manchester U.
Assess
Materials Performance
Gate materials
Contacts
Interfaces
MOS
-Identify Novel Metrology & Modeling Needs
D. Zhou, USC
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Beyond CMOS Materials & Interfaces
Assess• Ferromagnetic Materials, Dilute Magnetic Semiconductors• Complex Metal Oxides• Strongly Correlated Electron State Materials (FE, FM, FE & FM)• Molecules• Interfaces • Native Interconnects
Spin StateFerroelectric
Polarization
Negative Capacitance FET•Individual or Collective
Charge Based States Other Than Charge Only
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Memory Materials Workshop
2010.11.30, Tsukuba, Japan (38 participants)Redox RAM: How can we experimentally verify that the Redox RAM operating mechanism?
STT-RAM: What materials or interface research should be performed to enable reduction of write energy by 10X?
Even with the combination of MgO-CoFeB (normally in-plane), interface control enables Perpendicular MTJ.
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Lithography Novel Molecules
for Double Exposure
OR
RO
RO
OR RO
OR
OR
RO
OR
OR
RO
OR
Evolutionary Resist Design
-Positive Resist
Novel Molecules Resist
New Applications of Old Resist
Non-Chem Amp (193nm)
Negative Resist (EUV)
Molecular Glasses
Ober, Cornell
Hinsberg, IBM
Directed Self Assembly (DSA)
9DSA
Intermediate State
Tethered Anthracene
Bristol, Intel
Transition Evolutionary Resist to the Litho TWG
•Two DSA Workshops
•2011 Critical Assessment
•Defect Control
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Front End Processing
• Zero Impact Cleans• Selective etch• Selective deposition
Ho, Javey, Nature Materials 2008
Monolayer Doping
•DSA Produces Order•Implant Delivers Dopants
Massive Parallel Dopant Control
Deterministic Doping Workshop Progress
Deterministic Doping Workshop
Berkeley, CA
November 12, 2010
Bosworth,
Ober, ACS NANO 2008
Patterning & doping
via DSA
)
50nm
n-MOS p-MOS
X
Y
Z
Inoue, Ultramicroscopy 2009
3D atom probe
Roy, AsenovScience 2005
3D simulation
Metrology and Modeling Progress
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Interconnect Materials
Via
Wire
Via
Wire
Interconnects
- Carbon Nanotubes
-Graphene
Ultra-thin Barrier Layers
•Transition Zr Barriers to Interconnect TWG
•Novel sub 5nm materials
•SAMUltra low κ ILD
Novel Interconnects & Vias
Native Interconnect
MIRAI-Selete / TOSHIBA, APEX 3 (2010) 055002
Fujitsu Lab / CREST, APEX 3 (2010)
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
3D Interconnects
• Chip Attach Materials With Thermal Hierarchy– Electrical Interconnects– Nanosolders– Polymers
• Stress and Thermal Management Materials• Self Aligning Material Technologies
– Beyond surface tension…
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Assembly & Package
• 1D Interconnects– Critical Assessment – Nanosolder, CNT & NW
• Polymers with Mechanical, Electrical & Thermal Properties
• Polymers With Zero Moisture Absorption• Ion Free or Immune Mold Compound• Management of III-V & Ge Device Stress
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Hexagon of Assembly Material Requirements
• Highly coupled Material Properties• Apply novel materials to achieve optimal performance
CTE
ModulusFracture
Toughness
Functional
Properties
Moisture
ResistanceAdhesion
Examples
Thermal Interface Mat.
Mold Compound
Underfill
Adhesives
Epoxy
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
ESH Challenges• Materials needed to overcome significant
technical challenges– Low energy processes and new materials for low
energy integrated circuits– Few materials can meet requirements– Some materials have known hazards or
uncharacterized ESH properties– Stimulate ESH research in uncharacterized
materials– Good methods for materials ESH in Research,
Development & Manufacturing– Efficient use of materials
ITRS Winter Conference 2010 Makuhari, Japan
Work in Progress: Not for Distribution
Summary
2010: No Updates to ERM Chapter
2011: Updates to ERM ProgressCritical Assessments of ERM for Specific
ApplicationsTargeted Workshops on ERM Progresse-Workshops for Material Updates
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