issn 0953-8984 jour nal of physics journal of physics
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www.iop.org/journals/jpcm
ISSN 0953-8984
Journal of PhysicsCondensed Matter
SPECIAL SECTION CONTAINING PAPERS ON SURFACE NANOPATTERNS INDUCED BYION-BEAM SPUTTERING
FOREWORD
220301 Surface nanopatterns induced by ion-beam sputteringRodolfo Cuerno, Luis Vazquez, Raul Gago and Mario Castro
SPECIAL SECTION PAPERS
EXPERIMENTAL: NANOPATTERN MORPHOLOGIES
224001 Ion beam sputtering induced nanostructuring of polycrystalline metal filmsDebabrata Ghose
224002 Ion erosion induced nanogrooves: temporal evolution and azimuth dependenceHerbert Wormeester and Bene Poelsema
224003 Highly ordered nanopatterns on Ge and Si surfaces by ion beam sputteringB Ziberi, M Cornejo, F Frost and B Rauschenbach
224004 Ripple formation on silicon by medium energy ion bombardmentTapas Kumar Chini, Debi Prasad Datta and Satya Ranjan Bhattacharyya
224005 Ripple formation and smoothening on insulating surfacesRandall L Headrick and Hua Zhou
EXPERIMENTAL: ADVANCED CHARACTERIZATION
224006 Synchrotron x-ray scattering from metal surfaces nanostructured by IBSC Boragno and R Felici
224007 Ion-induced nanopatterns on semiconductor surfaces investigated by grazing incidence x-ray scatteringtechniquesD Carbone, A Biermanns, B Ziberi, F Frost, O Plantevin, U Pietsch and T H Metzger
EXPERIMENTAL: PATTERN FORMATION PROCESSES
224008 In situ x-ray studies of native and Mo-seeded surface nanostructuring during ion bombardment of Si(100)G Ozaydin-Ince and K F Ludwig Jr
224009 Production of nanohole/nanodot patterns on Si(001) by ion beam sputtering with simultaneous metalincorporationJ A Sanchez-Garcıa, R Gago, R Caillard, A Redondo-Cubero, J A Martin-Gago, F J Palomares, M Fernandezand L Vazquez
224010 Linear stability and instability patterns in ion-sputtered siliconCharbel S Madi, H Bola George and Michael J Aziz
EXPERIMENTAL: NOVEL CONFIGURATIONS
224011 Nanopatterning by multiple-ion-beam sputteringM Joe, J-H Kim, C Choi, B Kahng and J-S Kim
224012 Surface nanostructures by single highly charged ionsS Facsko, R Heller, A S El-Said, W Meissl and F Aumayr
M224013 Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during
ion–surface 3D interactions, from micromachining to self-organized picostructuresWarren J MoberlyChan
(Continued on inside back cover)
Bibliographic codes CODEN: JCOMEL 21 (22) 220301–225009 (2009) ISSN: 0953-8984
Journal of PhysicsCondensed MatterJournal of Physics
Volume 21 Number 22 3 June 2009
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Journal of Physics Condensed Matter
S Vol 21, No 22 220301–225009 3 June 2009
Volume 21 Number 22 3 June 2009
Journal of Physics
Featured in this issueSurface, Interface and Atomic-Scale Science
Special sectionSurface nanopatterns induced by ion-beam sputteringGuest Editors: Rodolfo Cuerno, Luis Vázquez, Raúl Gago and Mario Castro
CM21-22cover.indd 2-4 12/5/09 09:31:17
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