evg®7300 - ev group€¦ · automated uv nanoimprint solution up to 300 mm, featuring evg´s...
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EV Group Europe & Asia/Pacific GmbHDI Erich Thallner Strasse 14782 St. Florian am InnAustria+43 7712 5311 0
Contact
Contact@EVGroup.com
www.EVGroup.com
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Features
■ Fully automated UV-NIL imprinting and low-force detachment
■ Up to 300 mm substrates ■ 200 mm / 300 mm bridge-tool
capability ■ Continuous mode operation ■ Single-step full-area imprint
process ■ Volume manufacturing of
structures down to 40* nm and smaller
■ Supports a wide range of structure sizes and shapes, including 3D
■ Applicable on high-topography (rough) surfaces
*resolution dependent on process and template
Introduction
Automated UV Nanoimprint solution up to 300 mm, featuring EVG´s proprietary SmartNIL® technology
The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures.
Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.
EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high-power lamp and smooth stamp detachment.
Technical DataWafer diameter (substrate size) 200 mm / 300 mm
150 mm / 200 mm
Resolution ≤ 40* nm
Supported Process SmartNIL®
Exposure source High-power LED (i-line) > 400 mW/cm²
Alignment ≤ ± 3 µm
Stamp separation Fully Automated
Mini environment and climate control Optional
Working stamp fabrication Supported
EVG®7300Automated SmartNIL® UV-NIL System
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