array detectors

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Array Detectors. S W McKnight and C A DiMarzio. Focal Plane Arrays. Imaging Systems. H R Runciman, Thermal Imaging, CRC Press. Scanning vs. Staring Arrays. Scanning Systems Point detector or linear array with scanning optics Less complicated detector Calibration easier - PowerPoint PPT Presentation

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Array Detectors

S W McKnight and C A DiMarzio

Focal Plane Arrays

Imaging Systems

H R Runciman, Thermal Imaging, CRC Press

Scanning vs. Staring Arrays• Scanning Systems

– Point detector or linear array with scanning optics– Less complicated detector– Calibration easier– Scanning system expensive, fragile– Fast detector

• Staring Arrays– Multiple detectors elements to capture pixels of image– Less complicated optics (lighter, smaller, no moving parts)– Longer integration time to increase sensitivity– Need multiplexer for signal read-out

• Charge-Coupled Devices (CCD’s) – Charge transfer and collection– Easier processing, less interconnects

• CMOS– Individually addressed and processed pixels – Less power– No loss in tranfer

N-Channel FET Structure

Channel Length1 to 10 m

B, Body

n+ n+

S, Source G, Gate D, Drain

P-Type Material

SiO2 Insulator20-100m

Channel: 2 to 500 m into page

NMOSMetal-Oxide-Semiconductor

Energy Band Picture of MOSFET(No Bias—Flatband)

z

E

Ef

Metal (Al or Poly-Si)

Oxide (SiO2)

Semiconductor (p-Si)

Ec

Ev

Energy Band Picture of MOSFET(Positive Gate Bias)

z

E

Ef

Metal (Al or Poly-Si)

Oxide (SiO2)

Semiconductor (p-Si)

Ec

Ev

Va

Фb1

Фb2

MOSFET Carrier Reconfiguration (Depletion Bias)

z

E

Ef

Metal (Al or Poly-Si)

Oxide (SiO2)

Semiconductor (p-Si)

Ec

Ev

Va

Фb1

Фb2

Depletion Region

Creation of Depletion Layer and Inversion Channel

• Depletion layer forms within 1μs after bias is applied

• Inversion channel created by thermally generated carriers in ~ 1 s

• For times short compared to 1 s, non-equilibrium situation with depletion region and empty channel.

• Carriers created by optical absorption or external injection can be stored in well for many ms.

Carrier Injection

z

E

Ef

Metal (Al or Poly-Si)

Oxide (SiO2)

Semiconductor (p-Si)

Ec

EvVa>Vt Depletion

Region

Ef

Optical Injection Vo-Vi

Current Injection

Charge-Coupled Device (CCD)

Channel Length1 to 10 m

B

S G D S D

B

~10 m X nRows

Charge Transfer in CCD

J Allison, Electronic Engineering Semiconductors and Devices, McGraw-Hill

Streetman & Banerjee, Solid State Electronic Devices, Prentice-Hall

Focal Plane Arrays

• Monolithic Technology– Detector and read-out CCD on same chip– Parallel processing (lower cost)– Improved ruggedness– Lower performance – Lower yield

• Hybrid Technology– Detector and read-out fabricated separately and bonded– Single-device processing (more expensive)– Thermal mismatch– Choice of material for better performance

• HgCdTe for IR detector• Silicon for CCD

Hybrid Technology

H R Runciman, Thermal Imaging, CRC Press

Hybrid Focal Plane Array

J L Miller, Principles of Infrared Technology, Van Norstrand Reinhold

Array Interconnects

J L Miller, Principles of Infrared Technology, Van Norstrand Reinhold

Platinum-Silicide Schottky Detectors

Streetman & Banerjee, Solid State Electronic Devices, Prentice-Hall

PtSi Si

EB~0.22 eV ↔ λ=5.6 μ

PtSi Array Detectors

• Low quantum efficiency (~1%)

• Mid-Wave IR detection (1-5μ)

• Long integration time (~1/60 s)

• Good sensitivity ~0.05o C

• Compatible with Si technology

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