amirah kassim ultiemet presentation...ultrasonics sonochemistry 10 (2003) 363–368 • improved...
TRANSCRIPT
Ultrasonically enabled Low Temperature Electroless and Immersion Metallisation
AmirahKassimThe Functional Materials Applied Research Group
Coventry University
Ultrasonically enabled Low Temperature Electroless and Immersion Metallisation
• 3 year project, started in October 2010• Funded by: IeMRC• Objective: to reduce the plating temperatures used in electroless and immersion plating by the application of ultrasound
Ultrasonically enabled Low Temperature Electroless and Immersion Metallisation
Electroless and Immersion plating processes used in Photovoltaic and Printed Circuit Board manufacture
Process Temperature (oC) Comments
Electroless Copper 30 – 70 Contains formaldehyde
Electroless Nickel 50 – 90
High temperatures required for good
deposition rate Immersion
Silver 40 – 90
ImmersionGold 80 – 90
The effect of sound on the chemistry of a solution
103 104 105 106 107
HumanHearing
Diagnostic Ultrasound
20kHz – 2MHzExtended range ultrasound
for sonochemistry
Ultrasound
COMPRESSIONCOMPRESSION COMPRESSION COMPRESSION
RAREFACTION RAREFACTIONRAREFACTION RAREFACTION RAREFACTION
BUBBLE FORMS
GROWS IN SUCCESSIVE CYCLES
REACHES UNSTABLE SIZE
VIOLENT COLLAPSE
5000oC2000 ats
Acoustic cavitation in a liquid: NEAR A SURFACE
Solid Surface
Boundary Layer
Asymmetric collapse Rush of liquid from one side produces a powerful jet of
liquid targeted at the surface.
Video courtesy of University of Twente, Netherlands.and Shimadzu Europa GmbH, Duisburg, Germany
Acoustic cavitation in a liquid: NEAR A SURFACE
Electrochemical Effects
• Thinning of diffusion layer
• Improved mass transport
• Improved solution movement
• Electrode cleaning
• Degassing
Acoustic cavitation in a liquid: NEAR A SURFACE
Effect of ultrasound on plating rate
Workers Plated Metal Reducing Agent Plating rate
Increase Decrease
Abyaneh et al
Nickel Hypophosphite complexing agent= low
complxingagent = high
Mallory Nickel Hypophosphite lowthioureaconcentration
highthioureaconcentration
Masuoka and Hayashi
Nickel Hypophosphite
Yang et al Nickel Hypophosphite
Touyeras et al Copper Formaldehyde
Zaho et al Copper Formaldehyde
Ultrasonic frequency = 530kHz
Data reproduced by kind permission of;F. Touyeras et alUltrasonics Sonochemistry 10 (2003) 363–368
• Improved mass transport
• Thinning of diffusion layer
• Crystal structure formed under ultrasonic conditions
in the initial stages of plating (Abyaneh et al)
• Localised heating in the diffusion layer (Toyeras et al)
• Activation of catalyst
• Degassing
Rinse 5 minutes
Conditioner 5 minutes 30-60oC
Pre-dip 1 minute RT
Accelerator 2 minutes RT
Catalyst 5 minutes 30-50oC
Rinse 5 minutes
Rinse 3 minutes
Electroless Copper 25- 60 minutes 30-70oC
Pd
Pd
Pd
Pd
Pd
Pd
Pd
Pd
HCHOOxidation
Cu2+Reduction
2e-
Copper deposit on the surface of the substrate.
Electroless Copper – 3350-1 (Chestech Ltd) – EDTA based
Solution subjected to ultrasonic irradiation of different frequencies continuously for 4 hours.
UltrasonicFrequency
Copper Conc.after 4 hours
Copper Conc. after 48 hours
Control(Mechanical Stirring) 100% 100%
20 kHz(20 % Amplitude) Precipitated NA
40 kHz 100% 100%
582 kHz 100% 70%
863 kHz 100% Precipitated
20 kHz - Precipitates copper from solution after 4 hoursEffects of cavitation destroy chemicals in electroless formulation e.g. EDTA, stabilizers
40 kHz – Stable after 4 hours and 48 hours
High frequency (583/850 kHz) – unstableRadical formation – oxidation of chemicals in electroless formulation
Precipitate, 70% Cu in Solution
100% Cu in solution
Precipitated
Experimental Procedure
• Electroless Copper – 3350-1 (Chestech Ltd) – 1 litre
• Catalyst – 3344 (Chestech Ltd – Pd/Sn colloid)
• Substrate – Unclad epoxy laminate (IsolaDuraver 104)
• Temperature - 25, 30, 35, 40, 45 and 50 ºC
• Plating Time – 25 minutes
• Agitation - Ultrasound (40 kHz) or Magnetic StirringUltrasonic Bath – Langford, Model 475TT 40 kHz Power density 90.3 W/litre
Responses
1. Weight gain
Dry epoxy panels in oven for 24 hours at 120 ºCWeighProcess through Electroless CopperWeighDry epoxy panels in oven for 24 hours at 120 ºC
From weight gain calculate plating rate.
2. Morphology
Scanning Electron Microscope
Plat
ing
rate
µm
/25m
in
Main effect on plating rate is temperature – particularly above 40 ºCUltrasound had a slight negative effect at low temperatureSlight improvement at 35 ºC and above
Pd
Pd
Pd
Pd
Pd
Pd
Pd
Pd
Ultrasonic Microjets •Ultrasound scrubs surface and
removes catalyst
•Lowers plating rate
•Particularly problematic at low temperature – longer initiation time
•At high temperature (50 ºC) ultrasound always produces good results – short initiation time
Plat
ing
rate
µm
/25m
in
Plating rate rises as delay time increases to 7 minutes 10 minute delay causes plating rate to drop since almost half the plating time is without agitation
After 10 minutes ultrasound most of catalyst removed from surface
Plat
ing
rate
µm
/25m
in
7 minute delay – best plating results ‘with ultrasound’ at all temperaturesUltrasound with 7 minute delay at 40 ºC gives plating rates higher than ‘silent’ plating at 45 ºC
Ultrasound40 ºCSilent
Conditions: Frequency= 40kHz7 minute delay
Ultrasound reduces plating temperature
Reduces energy needed
Thank You
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