a safe solution to dopant gas desorption from metal surfaces · 2017. 6. 9. · risk concerns in...

TOXICAPTURETM

Takachiho Chemical Industrial Co., Ltd.

TOXICAPTURETM

A Safe Solution toDopant Gas Desorptionfrom Metal Surfaces

Junction Technology Group

September 22, 2010

　Maki EgamiTAKACHIHO CHEMICAL INDUSTRIAL CO,.LTD

TOXICAPTURETM


TOXICAPTURETM


What is Takachiho’sTOXICAPTURE TM?

_ TOXICAPTURETM is a micro-abatement system for

very small amount of toxic gas.

_ TOXICAPTURETM is a simple and easy solution toreduce:

-risk towards human health

-risk of polluting clean room environment

_ TOXICAPTURETM is used to further minimize trace

toxic dopant gas inside cylinder valve outlets


September 22, 2010

TOXICAPTURETM


_ Use of high pressure gases

_ Use of gases inside clean room

(VS.outside in gas cabinets)

_ Use of gases with extremely strong toxicity ACGIH Threshold Limit Values:

Risk Concerns in Ion Implantation


September 22, 2010

AsH3 PH3 BF3

0.05ppm 0.3ppm 1ppm

TOXICAPTURETM


_Very slow leak from valve

_Valve loosening due to vibration during transportation

_Wrong operation on valve handle

Toxicapture is effective for the following two!Toxicapture is effective for the following two!

_Gas desorption from metal surfaces

_Volatile chemical reaction occurring on metal surfaces

Common Causes of OperatorExposure to Toxic Fumes


September 22, 2010

TOXICAPTURETM


TOXIC GAS DETECTION

RIKEN KEIKI SC-90 type

TOXICAPTURETM


Takachiho’s Solution-TOXICAPTURE TM


September 22, 2010

22: Cap Body

23: Gasket

24: Reagent

25: Barrier of Sintering Metal

TOXICAPTURETM


TOXICAPTURE TM& Valve Diagram

_ Gas Connecting part_ Volume 1~1.5ml_ SUS Body Material_ Diaphragm_ Spring_ Stem


September 22, 2010

Problematice Outgassing Area

TOXICAPTURETM


2010 in Ｓｅｍｉｃｏｎ West

Prevention of dopant gas emission bysimple chemical reaction--

_ Non-poisonous reaction

_ Irreversible reaction

_ No Poisonous Metal

_ No air or water reaction

TOXICAPTURE TM is Very Safe

TOXICAPTURETM


Proving TOXICAPTURETM’s Effectivity-Experiment at ATMI

From ATMI’s Paper titled “Evaluation of ToxicaptureTM Filter forBF3 and PH3 Removal” written byPaul J. Marganski, ResearchEngineer of ATMI MLS R&D.

Static test setup to evaluate the reaction kinetics involved


September 22, 2010

TOXICAPTURETM


TOXICAPTURE TM

Experiment Results-PH3

Reaction Capacity:970µL (at 1atm,0℃) =43 µmol

Reaction Rate:51 µ L/hr =2.3μ mol/hr =1.4x10-5cc/sec

_ Enough capability to hold outgas from valve_ NOT enough to remove large amount of gas e.g.-a full cylinder of gas

From ATMI’s Paper titled “ Evaluation ofToxicaptureTM Filter for BF3 and PH3Removal” written by Paul J. Marganski,Research Engineer of ATMI MLS R&D.


September 22, 2010

TOXICAPTURETM


TOXICAPTURETM Effective Gases & Types of Fittings

_ Ion Implantation Gases: AsH3, PH3, BF3

_ Other Toxic Gases: CO, NO, SO2, HCl, Cl2, HF, H2S, NH3, etc.

_ Types of Fittings:

JIS type CGA 330 CGA 350


September 22, 2010

TOXICAPTURETM


VCR 1/2

Cup


September 22, 2010

VCR 1/4Plug

VCR _ Plug

TOXICAPTURETM Effective Gases & Types of Fittings

TOXICAPTURETM


TOXICAPTURETMInside Implant Equipment Gas Box


September 22, 2010

ToxicaptureMFC

Pressuregauge

Valves Cylinder

TOXICAPTURETM


PATENTSSTOXICAPTURETM

PATENTS

US Patent　


September 22, 2010

TOXICAPTURETM


PATENTS


September 22, 2010

SingaporePatent　

TOXICAPTURETMPATENTS

TOXICAPTURETM


PATENTS


September 22, 2010

ChinaPatent　

TOXICAPTURETMPATENTS

TOXICAPTURETM


Conclusion

_Although minimized, use of toxic gas in ion implantation still contains　risk of toxic fume exposure

_TOXICAPTURETM can further minimize this risk thru a miniaturizedgas abatement system placed in the outlet cap of a cylinder.

_TOXICAPTURETM’s effectiveness was quantified—it has enoughcapability to hold outgas from valves

_TOXICAPTURETM will help to maintain safe cylinder changes in ionimplantation

_TOXICAPTURETM in various forms may help to reduce: corrosion ofgas supply system, hazard in work environment, vacuum operationtime


September 22, 2010

TOXICAPTURETM


Thank you forYour attention!


September 22, 2010

a safe solution to dopant gas desorption from metal surfaces · 2017. 6. 9. · risk concerns in...

Documents