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2014 International Symposium on

Extreme Ultraviolet Lithography

October 27-29, Washington, D.C.

Stefan Wurm, SEMATECH

Patrick Naulleau, LBNL

Opening Address & Program Overview

Symposium Chair: Stefan Wurm (SEMATECH / GLOBALFOUNDRIES)

Symposium Co-Chair: Toshiro Itani (EIDEC)

Symposium Co-Chair: Kurt Ronse (imec)

27 October 2014

Welcome to the 2014 EUVL Symposium!

Hosted by: In cooperation with:

2014 EUVL Symposium 2

2014 EUVL Symposium Sponsors – Thank You!

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New in 2014: Student Sponsorships

27 October 2014 2014 EUVL Symposium

• A set amount of the symposium sponsorship contribution has been assigned to support student attendance of the symposium

• Sponsorships are being awarded through the 3-region (Asia/Pacific, Europe, North America) symposium abstract review process which results in a ranking of the submitted student abstracts

• Determined by the available funds, the top 11 number of students are being awarded sponsorship which includes registration, travel, and (shared) hotel rooms

• In 2014, student sponsorship were awarded to:

– 4 students from North America

– 3 students from Europe

– 4 students from Asia / Pacific

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27 October 2014

EUVL Symposium Attendance in 2014: By Geographic Region

267 registered as of October 26

United States 104 (39%)

Europe 59 (22%)

Asia / Pacific 104 (39%)

2014 EUVL Symposium 5

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EUVL Symposium Attendance by Year

0

50

100

150

200

250

300

350

400

450

500

310

354

417 383 368

463

325 344

443

362 339

283 267

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The EUVL Symposium is evolving

27 October 2014 2014 EUVL Symposium

• Since we started the EUVL Symposium in 2002, the emphasis has been very much on EUV readiness with some sprinkling in of EUV extendibility

• As EUV Lithography moves into pilot line introduction we decided, starting with the 2014 EUVL Symposium to shift the conference focus on EUV extendibility

• The 2014 EUVL Symposium program is split roughly 50:50 between contributions focusing on EUV readiness and EUV extendibility

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OSA International Workshop on Compact EUV & X-ray Light Sources

27 October 2014 2014 EUVL Symposium

Co-locating the two conferences provides a unique opportunity for the EUV and X-ray light source developers to • interact with the EUV lithography users • learn about their fundamental and practical needs • assess the current status of EUV/Soft X-ray sources

• 52 attendees have registered for both, the EUVL Symposium

and the OSA Workshop

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The 2014 EUVL Symposium Program Team

• Program Chair: Patrick Naulleau (LBNL)

• Program Co-Chairs: – Soichi Inoue (EIDEC)

– Winfried Kaiser – (Carl Zeiss)

27 October 2014

– Dr. Naulleau has been on the leading edge of EUV lithography research for over a decade

– 17 years at Lawrence Berkeley National Laboratory and in addition 3 years Associate Professor at University at Albany, SUNY

– Since April 2010 Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory

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The 2014 EUVL Symposium Support Team at the conference site

27 October 2014

Marcy Kelly &

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Program Overview

Conference Topics at a Glance

27 October 2014 2014 EUVL Symposium

Mon Oct-27

Tue Oct-28

Wed Oct-29

Thu Oct 30

Fri Oct-31

2014 EUVL Symposium OSA International Workshop on

Compact EUV & X-ray Light Sources

EUVL Insertion Readiness

Tools

Source Resist

EUVL Insertion Readiness

Mask Inspection

Optics Contamination

EUVL Extension

High NA Next Gen Sources

Next Gen Materials

Future Compact Source

Requirements and Technologies

EUV Litho

Mask inspection Wafer inspection

Materials discovery Biomedical

Workshop report outs

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Abstract count drops to 111

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0

50

100

150

200 175 173 170 155

167 182

121 146

122 111

Ab

stra

cts

Abstracts by region

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AP, 42, 38%

EU, 29, 26%

US, 40, 36%

Abstracts by topic

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0

10

20

30

Ab

str

ac

ts

Asia/Pacific Europe USA

Abstracts by affiliation

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Industry, 43, 39%

Consortia, 21, 19%

Academia, 36, 32%

Research Labs, 11,

10%

50% increase since 2011

11 student scholarships awarded across 8 universities

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Abstracts by affiliation

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0

5

10

15

20

25

Abstr

acts

Research Labs Consortia Academia Industry

Oral talks by region

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AP, 17, 35%

EU, 14, 28%

US, 18, 37%

Oral talks by topic

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0

5

10

15

Ab

str

ac

ts

Asia/Pacific Europe

Best Presentation / Best Poster Awards

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• We will be awarding $1,000 cash prizes to the best presentation and best poster of the 2014 EUVL Symposium

• Best Presentation and Best Poster selection: – When you return from the afternoon break on

Wednesday, a voting sheet will be at your seat. Please turn in this sheet to Marcy / Kelly right after the end of the last session on Wednesday

– The best poster will be selected by an industry group of senior experts

– Winners will be announced at the end of the session on Wednesday.

A friendly reminder for

• The audience to:

– Set cell phones to vibrate

– Do not take photographs or recordings

– Please use microphone for questions

• The presenters to:

– Turn in and check talks

– Stick to your allotted time

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